A Light Source Synchronization Control System for Dual-cavity Excimer Laser Based on Mopa Structure

Abstract

The invention discloses a light source synchronization control system of a dual cavity excimer laser based on an MOPA structure, wherein a trigger control module respectively generates trigger signals for triggering the MO cavity and the PA cavity for discharge excitation, and the MO cavity and the PA cavity are connected to each other for discharge excitation. The trigger signals are fed back to the delay measurement module; the delay measurement module calculates the discharge signals of the MO cavity and their corresponding discharge signals according to the sampled discharge signals of the MO cavity and the PA cavity, as well as the received trigger signals of the MO cavity and the PA cavity. The delay data between the trigger signals, and calculate the delay data between the discharge signal of the PA cavity and its corresponding trigger signal, and send the delay data of the MO cavity and the PA cavity to the trigger control module; trigger The control module generates the next trigger signal of the MO cavity and the PA cavity respectively according to the delay data of the MO cavity and the PA cavity. The invention realizes that stable dual-cavity synchronization can be obtained after a small number of trigger pulses, and meets the requirement of normal use in integrated circuit lithography.

Description

technical field [0001] The invention relates to the field of light source control of a double-cavity excimer laser, in particular to a light source synchronization control system for a double-cavity excimer laser based on a MOPA structure. Background technique [0002] Excimer lasers can provide high-energy, high-peak power, and high-beam-quality laser output in the ultraviolet and deep ultraviolet bands. During the interaction with substances, they can vaporize a variety of metal and non-metallic materials, resulting in neat cutting edges, thermal The impact area is extremely small, so excimer lasers are widely used in the field of industrial microprocessing, especially in the field of deep ultraviolet lithography. Excimer lasers are currently the mainstream light source for large-scale semiconductor integrated circuit lithography, and the largest application of excimer lasers is The field is used as a light source for the photolithography machine. [0003] In recent years...

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Problems solved by technology

[0007] In order to overcome the defects in the above-mentioned prior art, the present invention provides a light source synchronous control system of a dual-cavity excimer laser based on a MOPA structure, which solves the problem that the dual-cavity excimer laser in the prior art uses timing judgment based on trigger pulses, step by step The problem of too many adjustment pulses and too long response time caused by the adjustment method can realize stable dual-cavity synchronization after a small number of trigger pulses, thus meeting the needs of normal use in integrated circuit lithography

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