Reshaping device and flatness reshaping treatment process for heating stand

Abstract

The invention discloses a reshaping device for a heating stand. The reshaping device comprises a thermal reshaping furnace, balancing weights and mica sheets. An in-furnace platform of the thermal reshaping furnace is used for storing the heating stand. The mica sheets are arranged on the in-furnace platform. One side of each mica sheet is attached to the in-furnace platform, and the other side ofeach mica sheet is attached to the lower surface of the heating stand. The balancing weights are arranged on the upper surface of the heating stand in a laid manner. The contact area of the in-furnace platform and the heating stand is provided with a stainless steel product. The platform flatness of the in-furnace platform is less than or equal to 0.5 mm, and the surface of the in-furnace platform is in the pure flat state. The balancing weights are arranged in the center and at four edges of the to-be-reshaped heating stand in a laid manner. The balancing weights in the center are spread andlaid into a cross shape by one layer. The balancing weights at the four edges are laid by two layers in a staggered manner. The multiple mica sheets are laid in an area, needing to be covered, of theto-be-reshaped heating stand on the in-furnace platform. The invention further provides a flatness reshaping treatment process for the heating stand. The flatness reshaping treatment process comprises the steps of incoming material inspection, thermal reshaping, peeling, grinding, sand blasting and anodizing.

Description

technical field [0001] The invention belongs to the technical field of heat treatment, and in particular relates to a shaping device for a heating base and a flatness shaping treatment process for the heating base. Background technique [0002] During the manufacturing process of the liquid crystal display panel, it is necessary to use a chemical vapor deposition (Chemical vapor deposition, CVD for short) process to deposit some functional thin films on the surface of the glass substrate. In the chemical vapor deposition process, the glass substrate needs to be heated. In order to make the substrate evenly heated and film-formed, the heating base of the big generation (G8.5 and G10.5) has a uniform surface flatness and shape. There are strict requirements. [0003] The heating base (hereinafter referred to as SUSC) is currently an aluminum product in the liquid crystal display industry. G8.5 (length: 2580mm, width: 2290mm, thickness: 60mm) and above products are relatively ...

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Problems solved by technology

[0003] The heating base (hereinafter referred to as SUSC) is currently an aluminum product in the liquid crystal display industry. G8.5 (length: 2580mm, width: 2290mm, thickness: 60mm) and above products are relatively large in size. The surface is sprayed with glass beads. After the spraying, the flatness of the product will increase by 1.0-1.5mm due to the plastic deformation of the aluminum material due to the impact of the glass beads on the surface of the aluminum material, and it will be "umbrella"; SUSC traditional process: incoming inspection -Peel-grinding-sandblasting-pre-anodizing-thermal shaping-peeling-grinding-anodizing, this process has a long period of time, which greatly affects production efficiency, and there are many processes in the process, which increases the production cost and produces "three injuries" "The risk also increases

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