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PLC glow control method and device for diamond growth

A control method, diamond technology, applied in the direction of single crystal growth, crystal growth, single crystal growth, etc., can solve the problems of not being able to provide good conditions for diamond growth, and not being able to achieve organic unity

Active Publication Date: 2020-12-01
XIDIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the existing diamond growth process, the control of the vacuum pressure and the control of the glow discharge of the radio frequency power supply are operated independently, and the operator needs to carry out manual operations based on experience. Diamond growth provides good conditions

Method used

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  • PLC glow control method and device for diamond growth
  • PLC glow control method and device for diamond growth
  • PLC glow control method and device for diamond growth

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052]During the diamond growth process, it is necessary to control the glow discharge, which is the basic condition to ensure the normal growth of the crystal. According to the requirements of the diamond process, this embodiment divides the glow control into three stages: the growth preparation stage, the growth maintenance stage and the growth end stage, and describes the PLC glow control method in combination with each stage.

[0053] See figure 1 , figure 1 It is a schematic flowchart of a PLC glow control method for diamond growth provided by an embodiment of the present invention. The PLC glow control method comprises steps:

[0054] S1. Obtain the initial glow power and the formula table of glow power and vacuum pressure.

[0055] Specifically, the operator sets the glow parameters on the host computer, including setting the initial glow power and the recipe table of glow power and vacuum pressure during the diamond growth process, and the PLC controller obtains the...

Embodiment 2

[0070] On the basis of Example 1, please refer to Figure 4 , Figure 4 It is a schematic flowchart of another PLC glow control method for diamond growth provided by the embodiment of the present invention. The PLC glow control method comprises steps:

[0071] S1. Obtain the initial glow power and the formula table of glow power and vacuum pressure.

[0072] S2. Control the radio frequency power supply to turn on the glow discharge, and obtain the first real-time glow power and the first real-time pressure in the vacuum chamber, and compare the radio frequency power supply according to the comparison result between the standard vacuum pressure in the growth preparation stage and the first real-time pressure in the formula table Controlling is performed until the initial glow power reaches the target glow power, and at the same time the initial pressure in the vacuum chamber reaches the target pressure.

[0073] S3. Control the radio frequency power supply to continue the gl...

Embodiment 3

[0084] On the basis of Embodiment 1 and Embodiment 2, please refer to Figure 5 , Figure 5 It is a schematic structural diagram of a PLC glow control device for diamond growth provided by an embodiment of the present invention. The PLC glow control device includes a parameter acquisition module 51 , a glow discharge enabling module 52 , a glow discharge maintaining module 53 and a glow discharge closing module 54 . in,

[0085] The parameter obtaining module 51 is used to obtain the initial glow power and the formula table of glow power and vacuum pressure. The glow discharge start module 52 is connected with the parameter acquisition module 51, and is used to control the radio frequency power supply to start the glow discharge, and obtain the first real-time glow power and the first real-time pressure in the vacuum chamber, according to the standards in the growth preparation stage in the formula table The comparison result of the vacuum pressure and the first real-time p...

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Abstract

The invention relates to a PLC glow control method and device for diamond growth. The method comprises the steps: acquiring initial glow power and a formula table, controlling the radio frequency power supply to start glow discharge, controlling the radio frequency power supply according to a comparison result of the standard vacuum pressure of the growth preparation stage in the formula table andthe first real-time pressure, controlling the radio frequency power supply to continuously perform glow discharge to keep the target glow power unchanged, and meanwhile, controlling the target pressure to be unchanged, controlling the radio frequency power supply to gradually reduce the glow discharge power, and controlling the radio frequency power supply according to a comparison result of thestandard vacuum pressure of the growth end stage in the formula table and the second real-time pressure. According to the control method, vacuum pressure control and radio frequency power supply glowdischarge control are organically combined, and good conditions are provided for diamond growth.

Description

technical field [0001] The invention belongs to the technical field of automatic control, and in particular relates to a PLC glow control method and device for diamond growth. Background technique [0002] As a wide bandgap semiconductor material, diamond has many distinctive properties, such as large band gap, low dielectric constant, high breakdown voltage, high electron-hole mobility, high thermal conductivity and Superior radiation resistance and good chemical stability. All these physical, chemical and electrical properties make diamond have broad application prospects in many fields of industry and civil use. [0003] At present, the methods of artificially synthesizing diamond include high temperature and high pressure method (HTHP), direct current arc plasma jet method (DCAPJ), hot wire chemical vapor deposition method (HFCVD), microwave plasma chemical vapor deposition method (MPCVD) and so on. Among them, due to the good controllability of microwave-excited plasm...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/04C30B25/16
CPCC30B29/04C30B25/16
Inventor 任泽阳何琦张进成张金风梁振芳苏凯郝跃
Owner XIDIAN UNIV
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