RO + EDI efficient boron removal system

A high-efficiency, water-supply system technology, applied in multi-stage water treatment, water/sludge/sewage treatment, filtration treatment, etc., can solve problems such as inability to guarantee system water outlet requirements, reduce investment costs and operation and maintenance costs, reduce The effect of reducing the amount of discharged water and the risk of boron exceeding the standard

Pending Publication Date: 2020-12-22
CHINA ELECTRONICS INNOVATION ENVIRONMENTAL TECH CO LTD
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Problems solved by technology

[0004] The invention provides a RO+EDI high-efficiency boron removal system to solve the problem in the prior art that the traditional

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  • RO + EDI efficient boron removal system

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[0021] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0022] like figure 1 As shown, the present invention provides an RO+EDI high-efficiency boron removal system, including a pretreatment system 1, a primary RO system, a secondary RO system, an EDI system, a boron removal device 11, and a water supply system in sequence. The secondary RO system includes a security filter 2, a primary RO high-pressure pump 3, and a primary RO device 4. The secondary RO system includes a secondary RO high-pressure pump 5, a secondary RO device 6, and a secondary RO water tank 7. The secondary RO system includes a secondary RO high-pressure pump 5, a secondary RO device 6, and a secondary RO water tank 7. The EDI system includes an EDI booster pump 8, an EDI security filter 9, and an EDI device 10. The water...

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Abstract

The invention provides an RO + EDI efficient boron removal system which sequentially comprises a pretreatment system, a first-stage RO system, a second-stage RO system, an EDI system, a boron removaldevice and a water supply system, the first-stage RO system comprises a cartridge filter, a first-stage RO high-pressure pump and a first-stage RO device, and the second-stage RO system comprises a second-stage RO high-pressure pump, a second-stage RO device and a second-stage RO water tank. The EDI system comprises an EDI booster pump, an EDI cartridge filter and an EDI device, the water supply system comprises an ultrapure water tank and a rear-end polishing system, and a PH adjusting device is arranged between a water outlet of the first-stage RO device and a water inlet of the second-stageRO high-pressure pump. The problems in the prior art that the boron ions cannot be reduced to the target value through the traditional two-stage RO + EDI process and the water outlet requirement of the system cannot be ensured are solved.

Description

technical field [0001] The invention relates to a water treatment system, in particular to a RO+EDI high-efficiency boron removal system. Background technique [0002] With the increasing size of silicon wafers, the requirements for ultrapure water quality are also increasing. In the 8" and 12" semiconductor industry, the requirements for boron ion content in the effluent of ultrapure systems are between 50ppt and 10ppt. However, the boron content in tap water varies from place to place. The boron content in tap water in Zhejiang, Tianjin and other places has reached 60,000ppt, and boron ions are weakly electric and are very difficult to remove. Most of the boron in water is With boric acid (B(OH) 3 It exists in the form of ions, the electricity is very weak, and the reversible hydrolysis reaction often occurs in water. Therefore, it is necessary to change a special method for boron removal in the ultrapure water system to solve the problem of boron ion removal in the secon...

Claims

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Application Information

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IPC IPC(8): C02F9/06C02F103/04
CPCC02F9/00C02F1/001C02F1/441C02F2301/08C02F1/42C02F1/4693C02F2103/04
Inventor 李彩娟何嘉慧孙震戎宇舟
Owner CHINA ELECTRONICS INNOVATION ENVIRONMENTAL TECH CO LTD
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