Method of calculating Ronchi shear interference image in photoetching projection objective

A technology for projecting an objective lens and an interference image, applied in the field of optical measurement, can solve the problems such as the limitation of the calculation method and the difficulty of accurately obtaining the sheared interference image, and achieve the effect of avoiding the limitation.

Active Publication Date: 2020-12-22
DONGFANG JINGYUAN ELECTRON LTD
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the problem that the current existing detection method based on the Ronchi shear interference image has a large limitation of the calculation method, which makes it difficult to obtain the shear interference image accurately, the present invention provides a Ronchi shear interference in the calculation lithography projection objective lens image method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of calculating Ronchi shear interference image in photoetching projection objective
  • Method of calculating Ronchi shear interference image in photoetching projection objective
  • Method of calculating Ronchi shear interference image in photoetching projection objective

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and implementation examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0037] It should be noted that when an element is referred to as being “fixed” to another element, it can be directly on the other element or there can also be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and similar expressions are used herein for purposes of illustration only.

[0038] Please refer to Figure 1-Figure 2 , the first embodiment of the present invention provides a meth...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a method for calculating a Ronchi shear interference image in a photoetching projection objective. According to the method, a strict photoetching vector model is used for calculation in the process of transmitting light emitted by a light source from an object-side grating to an image-side grating, and the method can be suitable for object-side and image-side gratings in anyshape. And strict Rayleigh-Sommerfeld diffraction integration is adopted for calculation in the process of light from the image space optical grating to the receiving screen. According to the methodfor calculating the Ronchi shear interference image in the photoetching projection objective, calculation is carried out by adopting a strict photoetching vector model and Rayleigh-Sommerfeld diffraction integration, so that near fields or far fields of an object space grating and an image space grating do not need to be considered, and paraxial approximation and other factors do not need to be considered for a receiving screen; the problem that a shearing interference image is difficult to obtain accurately due to large limitation of a traditional test method is solved.

Description

【Technical field】 [0001] The invention relates to the technical field of optical measurement, in particular to a method for calculating a Ronchi shear interference image in a lithographic projection objective lens. 【Background technique】 [0002] The high-precision and high-speed detection system for extracting the wave aberration of the projection objective lens is the core subsystem of the high-end lithography machine. Wave aberration is the main parameter of the imaging quality of the projection objective lens, which directly determines the resolution and overlay accuracy of the lithography machine. The wave aberration of the projection objective lens of high-end lithography machines has reached below 1nm, and as the production rate increases, the thermal image of the lens The difference is more significant. [0003] In the existing detection methods based on the Ronchi shearing interference image, it is usually assumed that the object-space grating is an ideal periodic ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G01J9/02
CPCG03F7/70591G03F7/70616G01J9/0215Y02E60/00
Inventor 牛志元施伟杰
Owner DONGFANG JINGYUAN ELECTRON LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap