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Mev-based ion beam analysis apparatus

A technology of ion and beam tubes, which is applied in the direction of material analysis, analytical materials, and measuring devices using wave/particle radiation, which can solve problems such as high specific costs, inability to achieve economic importance, and complex structures, and achieve cost improvement, Improved local resolution, precise alignment results

Pending Publication Date: 2021-01-19
KERNFORSCHUNGSANLAGE JUELICH GMBH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, due to the hitherto complex structures and high specific costs, it has not been able to achieve the same economic importance as electron microscopy

Method used

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  • Mev-based ion beam analysis apparatus
  • Mev-based ion beam analysis apparatus
  • Mev-based ion beam analysis apparatus

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Embodiment Construction

[0097] The technical structure of the invention according to an embodiment of the invention combines a triple-quadrupole focusing magnet, a UHV measuring chamber, a vibration isolation table and a detector structure. The magnet induces a magnetic field strength up to 0.4T along the optical axis. They can be aligned with an accuracy of 1 μm. The magnet manufacturer specifies a beam current of 0.6nA for a spot size of 1µm and a distance of 160mm between the last magnet and the sample. For a good detection limit of light elements at a depth resolution of about 100 nm, a few hundred pA define the practical limit. Thus, the ion beam section can provide the desired beam characteristics.

[0098] According to the proposal of the present invention, the technical structure in this precision field combined with the design of frequent sample changes, and the requirement for precise angular alignment and low ion-specific dose, requires the development of a new type of MeV ion analysis e...

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PUM

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Abstract

The invention relates to a device for an MeV-based ion beam analysis of a sample, comprising a vacuum measurement chamber with at least one detector and a camera, a vacuum system for producing a vacuum within the vacuum measurement chamber, an ion beam tube and a focusing system for focusing the ion beam, and a sample transfer system comprising a sample manipulator with a sample holder for receiving at least one sample. According to the invention, the device additionally comprises a coupling-in system for the vacuum-tight connection of the ion beam tube to the measurement chamber, which comprises an ion beam vacuum feedthrough, a mounting means for a detector, a mounting means for the camera and a mounting means for the sample transfer system.

Description

technical field [0001] The invention relates to the field of material analysis by means of ion beam microscopy, in particular for the quantitative and local analysis of sample components. Background technique [0002] Numerous analytical methods for determining the composition of material samples are known from the literature. In this case, ion beam analysis is particularly suitable for qualitative and quantitative analysis. [0003] Ion beam analysis (IBA) includes methods that use different particle beams with energies in the order of several MeV in order to examine and analyze material composition near the sample surface (i.e. in the depth range of about 10 μm) of each concentration. This method works non-destructively in most cases and requires no references. This method makes it possible to obtain elemental or isotopic depth profiles, either as absolute quantities or as concentration statements, if combined with computer-based interpretation. Furthermore, ion beam a...

Claims

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Application Information

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IPC IPC(8): G01N23/2257
CPCG01N23/2257H01J37/28H01J37/3002
Inventor S·梅勒D·赫申S·库尔特A·M·希勒C·肖尔蒂西克G·埃泽C·林斯迈尔
Owner KERNFORSCHUNGSANLAGE JUELICH GMBH