Mask plate cleaning method and device

A mask plate and cleaning agent technology, applied in the field of mask plate cleaning methods and devices, can solve the problems of poor elution effect of a single organic solvent, inability to recycle the medicinal solution, and easily confused classification, and reduce solvent consumption. amount, eliminate superficial effects, reduce the effect of variety and quantity

Inactive Publication Date: 2021-02-23
深圳市海博源光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But there are following defects: (1) organic solvent immersion treatment, spray treatment and pure water cleaning treatment are required before electrolytic treatment, and there are many treatment steps, and the solvents used are different, and it is easy to confuse when adding liquid; (2) single organic The solvent elution effect is not good; (3) the liquid medicine cannot be recycled, the pollution is serious, and the cost is high

Method used

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  • Mask plate cleaning method and device
  • Mask plate cleaning method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] A method for cleaning a mask plate, the mask plate being a metal mask plate, the cleaning method comprising the following steps:

[0057] S110, putting the mask plate to be cleaned into an organic cleaning agent for ultrasonic immersion cleaning.

[0058] Specifically, the mask plate to be cleaned is sequentially put into the first ultrasonic soaking tank 110, the second ultrasonic soaking tank 120 and the third ultrasonic soaking tank 130 all filled with the organic cleaning agent, and ultrasonic soaking is carried out. cleaning. The ultrasonic soaking and cleaning conditions of the first ultrasonic soaking tank 110 , the second ultrasonic soaking tank 120 and the third ultrasonic soaking tank 130 are: power 3kw, time 8min, frequency 80kHz.

[0059] S120 , cleaning the soaked and cleaned mask with ultrasonic vibration using the organic cleaning agent.

[0060] Specifically, the soaked and cleaned mask plates are sequentially put into the first ultrasonic shaking clea...

Embodiment 2

[0067] A method for cleaning a mask plate, the mask plate is an In (indium) mask plate, and the cleaning method comprises the following steps:

[0068] S210, putting the mask plate to be cleaned into an organic cleaning agent for ultrasonic immersion cleaning.

[0069] Specifically, the mask plate to be cleaned is sequentially put into the first ultrasonic soaking tank 110, the second ultrasonic soaking tank 120 and the third ultrasonic soaking tank 130 all filled with the organic cleaning agent, and ultrasonic soaking is carried out. cleaning. The ultrasonic soaking and cleaning conditions of the first ultrasonic soaking tank 110 , the second ultrasonic soaking tank 120 and the third ultrasonic soaking tank 130 are all: power 3kw, time 8min, frequency 120kHz.

[0070] S220 , cleaning the soaked and cleaned mask with ultrasonic vibration using the organic cleaning agent.

[0071] Specifically, the soaked and cleaned mask plates are sequentially put into the first ultrasonic ...

Embodiment 3

[0078] A method for cleaning a mask plate, the mask plate being a metal mask plate, the cleaning method comprising the following steps:

[0079] S310, putting the mask plate to be cleaned into an organic cleaning agent for ultrasonic immersion cleaning.

[0080] Specifically, the mask plate to be cleaned is sequentially put into the first ultrasonic soaking tank 110, the second ultrasonic soaking tank 120 and the third ultrasonic soaking tank 130 all filled with the organic cleaning agent, and ultrasonic soaking is carried out. cleaning. The ultrasonic soaking and cleaning conditions of the first ultrasonic soaking tank 110 , the second ultrasonic soaking tank 120 and the third ultrasonic soaking tank 130 are all: the power is 3kw, the time is 8min, and the frequency is 170kHz.

[0081] S320 , cleaning the soaked and cleaned mask with ultrasonic vibration using the organic cleaning agent.

[0082] Specifically, the soaked and cleaned mask plates are sequentially put into the...

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PUM

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Abstract

The invention discloses a mask plate cleaning method and device. The method comprises the following steps that a to-be-cleaned mask plate is put into an organic cleaning agent for ultrasonic soaking cleaning, and ultrasonic shaking cleaning is conducted on the mask plate subjected to soaking cleaning through the organic cleaning agent, and the mask plate subjected to ultrasonic shaking cleaning isput into an electrolyte for electrolytic treatment and ultrasonic pure water cleaning; wherein the organic cleaning agent is composed of the following raw materials in percentage by weight: 45-65% ofcyclohexanone, 0.5-10% of methylbenzene, 2-15% of diacetone alcohol and 20-50% of acetone. The organic cleaning agent in the invention does not damage the size of the mask plate and has reusability,and the effect of the organic cleaning agent is highly accepted by related manufacturers. Compared with an organic cleaning agent sold in the market at present, only one solvent is used before the electrolytic treatment step, cleaning is achieved at a time without classification, in addition, the elution effect is better, the European Union RoHS standard is met, it is guaranteed that the cleaned mask plate cannot release acid in the vacuum environment, and therefore the influence on the surface of the mask plate is eradicated.

Description

technical field [0001] The invention relates to the field of manufacturing electronic semiconductor components, in particular to a method and device for cleaning a mask plate. Background technique [0002] The downstream application fields of photolithography masks are relatively wide, including touch screen industry, flat panel display and other industries. Among them, the touch screen industry is affected by intensified competition, and the industry concentration will further increase, and large-scale enterprises will benefit from it. The flat panel display industry will maintain relatively rapid growth benefiting from the market demand for smart phones, new applications such as large public displays, medical displays and wearable devices. [0003] The lithography machine, the core equipment for mask manufacturing, has high technical content, and there are few manufacturers of this type of equipment in the world, which belongs to a highly monopolized market. my country c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/12B08B3/08G03F1/82
CPCB08B3/08B08B3/12G03F1/82
Inventor 张明
Owner 深圳市海博源光电科技有限公司
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