160results about How to "Increase film thickness" patented technology

A plasma CVD apparatus for forming a thin film on a wafer having diameter Dw and thickness Tw, includes: a vacuum chamber; a shower plate; a top plate; a top mask portion for covering a top surface peripheral portion of the wafer; and a side mask portion for covering a side surface portion of the wafer. The side mask portion has an inner diameter of Dw+α, and the top mask portion is disposed at a clearance of Tw+β between a bottom surface of the top mask portion and a wafer-supporting surface of the top plate, wherein α is more than zero, and β is more than zero.

The present invention provides a liquid crystal display device with high image visibility at low power consumption and produced at low cost by using an interlayer dielectric film, which has low dielectric constant, high heat-resistant property, high optical transmissivity, high film thickness and high flattening property produced at low cost. An organic siloxane dielectric film is used as an interlayer dielectric film of the liquid crystal display device. A ratio of nitrogen content to silicon content (Ni content/Si content) in the interlayer dielectric film is controlled to 0.04 or more in the element ratio. The limiting film thickness to suppress and limit the cracking caused by the thickening of the interlayer dielectric film is set to 1.5 μm or more.

Disclosed is a pigment dispersion exhibiting both high contrast and adequate dispersion stability, wherein a granulated pigment is used. Also disclosed is a coloring composition for color filters having good developability, which uses the pigment dispersion. Specifically disclosed is a pigment dispersion containing a pigment, a solvent and a dispersing agent, which is characterized in that the dispersing agent contains a block copolymer composed of a block A having an affinity for solvents and a block B having a functional group containing a nitrogen atom. This pigment dispersion is also characterized in that the dispersing agent has an amine number of not less than 80 mgKOH/g but not more than 150 mgKOH/g in terms of the effective solid content. Also specifically disclosed is a use of such a pigment dispersion.

A method is provided for electrochemically depositing a polymer with spatial selectivity. A substrate having a substrate surface is contacted with an aqueous solution containing a selectively insolubilizable polysaccharide, such as chitosan, which is subjected to electrochemically treatment to deposit, with spatial selectivity, the selectively insolubilizable polysaccharide on a patterned electrically conductive portion of the substrate surface.

Disclosed is a tie coat which is formed on a surface of a base or an undercoating film prior to formation of an organopolysiloxane-based antifouling coating film and is formed from a moisture-curing organopolysiloxane-based composition comprising (b1) organopolysiloxane having condensing functional groups at both ends of a molecule and/or (b2) a curing composition formed by subjecting the component (b1) and an extender pigment selected from the group consisting of silica, calcium carbonate, talc, mica, clay, kaolin and barium sulfate to contact treatment with heating or without heating. Also disclosed is a composite coating film wherein on a surface of the above tie coat is formed a finish coat formed from a three-pack type organopolysiloxane-based curing composition comprising (c1) a main agent comprising the component (b1), (c2) a curing agent component comprising tetraalkoxysilicate or its condensate and (c3) a curing accelerator component comprising a metallic compound. Further disclosed is a composite coating film wherein an epoxy-based sealer coat, the tie coat and the finish coat are formed in this order on a surface of an old antifouling coating film (G). There is provided by the invention a tie coat capable of forming a composite coating film having excellent interlaminar bond property. The composite coating film is favorably formed on a surface of a base, an undercoating film, an old antifouling coating film or the like, has excellent interlaminar bond strength and antifouling property and is preferably used for coating outer surfaces of ships, submerged parts of marine structures, water supply/drainage channels of atomic power plant, etc.

A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.

There is provided an underlayer coating that causes no intermixing with photoresist layer, can be formed by a spin-coating method, and can be used as a hard mask in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition used in manufacture of semiconductor device comprising metal nitride particles having an average particle diameter of 1 to 1000 nm, and an organic solvent. The metal nitride particles contain at least one element selected from the group consisting of titanium, silicon, tantalum, tungsten, cerium, germanium, hafnium, and gallium.

The invention belongs to a control system technique, in particular to a method for controlling plasma intensified chemical vapor phase deposition equipment. The method comprises the equipment initialization control, the wafer processing flow control and the equipment exception alarming control, wherein the equipment initialization control comprises the steps of starting a power supply of the equipment, turning on an alarm monitor, and sending initialization instructions of a sheet transmitting cavity and a reaction cavity; the wafer processing flow control comprises the steps of leading in a technique formulation, and using a batch or layer formulation to perform processing initialization, water processing and processing ending control; the equipment exception alarming control realizes the monitoring of equipment exception and failure, and performs the step treatment on the equipment alarming through an exception pretreating mechanism and an alarming response processing mechanism. The invention realizes the accurate process control to the chemical vapor phase deposition, and meets the process requirement in the process of manufacturing semiconductor devices.

The invention provides a vacuum drying cavity and a vacuum drying device, relates to the technical field of organic solution film formation, and can solve the problem of weak film thickness uniformityof dried substrate film layers caused by adjustment and judgment of the evaporation speed of organic solvent in the substrate film layers according to detected environmental vacuum degree in a traditional vacuum drying device. The vacuum drying cavity comprises a vacuum cavity, and a carrying table and a condensation plate oppositely arranged in the vacuum cavity; the carrying table is used for bearing substrates to be dried; the plate surface temperature of the condensation plate is lower than the table surface temperature of the carrying table; the surfaces of films layers to be dried of the substrates to be dried are towards the condensation plate; and an organic solvent concentration detector is arranged in the vacuum cavity.

The invention discloses dip-coating water-based paint for a transmission shaft and a preparation method thereof and relates to the technical field of metal water-based paint. The dip-coating water-based paint is prepared from the following raw materials in parts by weight: 20 to 40 parts of waterborne acrylic modified epoxy resin and epoxy modified acrylic resin, 0.3 to 3 parts of a drier, 0.4 to 1.5 parts of a pH (Potential of Hydrogen) regulator, 0.6 to 1.5 parts of a dispersant, 0.3 to 0.5 part of a de-foaming agent, 0.05 to 3 parts of carbon black, 0.01 to 1 part of graphene oxide, 4 to 12 parts of iron oxide black, 2 to 20 parts of antirust pigment, 3 to 8 parts of talcum powder, 0.5 to 8 parts of heavy calcium carbonate, 3 to 8 parts of barium sulfate, 0.05 to 0.15 part of an anti-sedimentation agent, 2 to 3 parts of a film forming auxiliary agent, 0.1 to 0.5 part of a wetting agent, 0.1 to 0.5 part of a leveling agent, 0.1 to 0.5 part of a flash-rust resisting agent, 0.1 to 1.2 parts of a thickener and 10 to 28 parts of water. The water-based paint has the advantages of easiness of improving a film thickness, high rigidity, good wear-resisting and corrosion-preventing effects, capability of being rapidly dried at room temperature and extremely low VOC (Volatile Organic Compounds) content.

The present invention provides one kind of pressure cast aluminum alloy and its application, and belongs to the field of material science. The pressure cast aluminum alloy consists of Si 4-8 wt%, Mg 1-5 wt%, and Al for the rest. The pressure cast aluminum alloy is applied to produce hard anodized oxide film through the following steps: smelting, pressure casting, modifying mechanically, and forming hard anodized oxide film. The pressure cast aluminum alloy has anodized oxide film with great thickness, high hardness and high corrosion resistance.

The objective of the present invention is to provide a pigment dispersion liquid in which both high contrast and dispersion stability are achieved when the pigment which is made into fine particles is used, and also to provide a colored composition for a color filter having good development property by using the same. The present invention provides a pigment dispersion liquid comprising a pigment, a solvent and a dispersant, wherein said dispersant comprises a block copolymer comprising a block A having a solvent affinity and a block B having a functional group comprising nitrogen atom, and an amine value of said dispersant is 80mg KOH/g or more and 150mg KOH/g or loss in terms of an effective solid content. The present invention also provides an application thereof.

A film formation substrate (200) is arranged such that (i) a base end, in a y-axis direction, of a film-thickness-gradually-diminishing part (23sR) of a first film (23R) overlaps a first film formation region (24R), and (ii) a film-thickness-gradually-diminishing part (23sB) of a second film (23B) is disposed on an outside, in the y-axis direction, of a second film formation region (24B) and overlaps the film-thickness-gradually-diminishing part (23sR) of the first film (23R) so as to compensate for a gradually diminished thickness of the film-thickness-gradually-diminishing part (23sR).

The present invention provides a photomask blank in which a light-shielding film consisting of a plurality of layers is provided on a light transmissive substrate, wherein a layer that is provided to be closest to the front surface is made of CrO, CrON, CrN, CrOC or CrOCN, and wherein the atom number density of the front-surface portion of the light-shielding film is 9×10²² to 14×10²² atms/cm³.

The invention discloses a novel organic electroluminescence device. The device comprises a first electrode, a second electrode and one or more layers of organic layers between the first electrode andthe second electrode. Each organic layer at least comprises a light emitting layer and an electronic transmission layer. The device is characterized in that the thickness of each electronic transmission layer is 5-100nm; each electronic transmission layer comprises at least one kind of compound shown by the formula (I) shown in the description, wherein L is selected from a chemical bond, an arylidene or sub-polycyclic aromatic hydrocarbon group of C6-C12, and a sub-heteroaryl or sub-polycyclic heteroaryl aromatic hydrocarbon group of C3-C12; the Ar1, the Ar2 and the Ar3 are respectively selected from the substituted or non-substituted aryl or polycyclic aromatic hydrocarbon group of C6-C30, and the substituted or non-substituted heteroaryl group or polycyclic heteroaryl aromatic hydrocarbon group of C3-C30; the R1, the R2, the R3 and the R4 are selected from hydrogen, the alkylene of C1-C10, the halogen, the cyan, the nitryl, the substituted or non-substituted aryl or polycyclic aromatic hydrocarbon group of C6-C30, and the substituted or non-substituted heteroaryl group or polycyclic heteroaryl aromatic hydrocarbon group of C3-C30; and the R3 can be connected with the R4, so an annular structure can be formed. According to the invention, the device is advantaged by low working voltage and high light emitting efficiency.

The invention discloses an UV-curing coating. The UV-curing coating comprises the following components in parts by weight: 16-25 parts of bisphenol A epoxy acrylate resin, 4-10 parts of phenolic epoxy acrylate, 8-15 parts of epoxidation oil propionate, 10-25 parts of active diluents, 1-5 parts of photoinitiators, 6-12 parts of organic amine, 1-4 parts of auxiliary agents and 30-50 parts of a solvent. The UV-curing coating is used for making a printed circuit board and a substrate which has difficult adherence performance or a soft base material, the UV-curing coating has the advantages of fast light-curing speed of the coating, high coating hardness, good corrosion resistance, good heat resistance, good wetability, light irritation on skin, easy acquisition of the raw materials, and low cost.

The present invention discloses method of preparing porous nanometer crystal TiO2 film in high viscosity solvent. Inside mixed solvent of anhydrous alcohol and high viscosity reagent terpineol or inside solvent of high viscosity reagent decyl alcohol, butyl titanate as precursor and complexing agent NH(C2H5OH)2 are added, mixed water and ethanol solvent is dropped, and template agent PEG is added via strong stirring to form sol; and through further sol pre-treatment, soaking-drawing film coating and calcining, porous nano crystal TiO2 film is prepared. The said process has increased film thickness, raised apparatus utilization, raised regularity and orderliness of pore structure and increased specific surface area of film. The porous nano crystal TiO2 film may be used widely in photocatalysis, electrochromism, chemical sensitive device, solar cell, etc.

The invention relates to a high-thickness and high-conductivity PEDOT film and a preparation method thereof. The PEDOT film containing PEDOT:X is prepared from an EDOT monomer as a raw material and a weak basic anion-containing high-alcohol-solubility ferric salt FeX<3> as an oxidizing agent by adopting a gas phase method or a solution method, wherein X is high-alcohol-solubility weak basic anions, preferably, at least one of camphosulfonate ions, long-chain alkylbenzene sulfonate ions, alkyl naphthalene sulfonate ions, dialkyl naphthalene sulfonate ions and dinonyl naphthalene disulfonate ions. According to the film and the preparation method thereof, by utilizing high alcohol solubility of a ferric salt oxidizing agent solution of a precursor, the concentration and viscosity of a spin-coating solution are improved, the crystallization of the oxidizing agent in a reaction process is inhibited, and copolymer anti-crystallization inhibitors (pyridine, PEPG and the like) do not need to be added, so that a high-thickness PEDOT film is obtained.

To provide a solid-state imaging device capable of improving color mixing, line shading, and sensitivity errors from adjacent color filter layers. It is a solid-state imaging device (1) in which a plurality of pixels having a photoelectric conversion element (13) and a color filter layer (21) formed on the photoelectric conversion element (13) are arranged in a matrix on a semiconductor substrate (11). ), in addition, on the boundary area with the adjacent photoelectric conversion element (13), there is a resin portion (20) formed protruding from the formation surface, and each color filter layer (21) is formed on the adjacent resin portion (20) ), the film thickness of each color filter layer (21) in the peripheral portion corresponding to the top portion is formed thinner than that in the central portion.

The invention provides a compound of general formulae (I) and (II), wherein A1 and A2 are independently selected from C1-12 alkyl, C6-60 substituted or unsubstituted aryl and C10-60 substituted or unsubstituted condensed ring aryl, separately; the substituted aryl specifically means that the substituent is selected from C1-6 alkyl, halogen and CN or Si(R2)3, and R2 is selected from C1-6 alkyl; andthe substituted condensed ring aryl specifically means that the substituent is selected from C1-6 alkyl, halogen and CN or Si(R2)3, and R2 is selected from C1-6 alkyl. The compound of the general formulae can be used in organic electroluminescence devices.

Gate insulation films each containing titanium oxide as a primary constituent material are formed on one major surface of a semiconductor substrate. Gate electrode films are formed in contact with the gate insulation films. The gate electrode films contain ruthenium oxide or alternatively iridium oxide as a primary constituent material. In order to prevent electrically conductive elements from diffusing into titanium oxide of the gate insulation films, ruthenium oxide or iridium oxide is effectively used as a primary constituent material of the gate electrodes. A semiconductor device can be realized in which occurrence of a leak current is suppressed by increasing a physical film thickness while sustaining desired dielectric characteristic.

Disclosed is a colorant dispersion liquid which enables to reduce the amount of undissolved photosensitive colored composition remaining in non-image portions on a substrate when it is applied over the substrate. The colorant dispersion liquid has excellent adhesion to the substrate and does not deteriorate image-forming properties such as curability, so that it enables to produce a color filter having high concentration and low film thickness. In addition, since drying/clogging at a die lip edge is suppressed during application of this colorant dispersion liquid by die coating, this colorant dispersion liquid enables to produce a color filter with high yield. Specifically disclosed is a colorant dispersion liquid containing a colorant (A), a dispersing agent (B) and a solvent (C) which is characterized in that the dispersing agent (B) contains at least a graft copolymer (a) containing a nitrogen atom and a polymer (b) which is obtained by polymerizing a monomer component essentially containing a specific compound.

The invention provides a magnetron sputtering device and a magnetron sputtering method. A magnet set in the magnetron sputtering device is set to have a plurality of magnet units which are arranged at intervals and distributed in a matrix way, and the S poles and the N poles of the plurality of magnet units in each line and each row of the magnet set are alternatively distributed to form a uniform magnetic filed with matrix periodicity, so that the wear rates of all regions of a target are uniform, target utilization rate is greatly improved, and the film thickness and stress uniformity of film formation are improved; and meanwhile, during magnetron sputtering processing, a motor can drive the whole magnet set to reciprocate in front-back and left-right directions in a horizontal direction, and a plurality of motors can control the plurality of magnet units to respectively move up and down, so that the consumption of the target is more uniform, and the service life of the target is prolonged.

A film adhesion device includes a table carrying a semiconductor wafer, a pressing member (pressing roller) which presses a film (photoresist film) onto a surface side of the semiconductor wafer placed on the table, a bumper member provided on an outer peripheral side of the table and including a contact surface which is contacted by the pressing member when the pressing member presses the film, and an elevating support mechanism which supports the bumper member elevatably and positions the bumper member at a predetermined height level.

The invention relates to a preparation method for a carbon nanofiber electrode material, and particularly relates to a technology for preparing high-hardness large-aperture thick film as a nanofiber template through mixed acid. Hexagonal scrobiculate porous nano alumina templates distributed orderly are prepared by adopting the method; and through the method, the anode oxidization temperature can be greatly improved, the voltage value in electrolysis can be reduced, and more energy can be saved; at room temperature, fast response time and higher sensitivity can be obtained when a gas sensor of a compound thin film produced by nickel/hollow carbon nanofiber obtained by adopting the method is used for detecting NOx gas.