Negative photosensitive resin composition, partition wall and optical element
A technology of photosensitive resin and composition, which is applied in the direction of optical components, optical, electrical components, etc., can solve the problems of reduced ink repellency of the partition wall, poor ink repellency of the surface of the partition wall, and poor ink affinity of the side of the partition wall, etc. Achieve the effect of good appearance, good ink repellency and good coating property
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[0379] Hereinafter, the present invention will be described in more detail using examples, but the present invention is not limited to these examples. In addition, Examples 1-5, 8-10 are examples, and Examples 6, 7, and 11 are comparative examples.
[0380] Each measurement was performed by the following method.
[0381] [Number average molecular weight (Mn)]
[0382] The gel of several monodisperse polystyrene polymers with different degrees of polymerization commercially available as a standard sample for molecular weight measurement was measured using a commercially available GPC measuring device (manufactured by Tosoh Corporation, device name: HLC-8320GPC) Permeation Chromatogram (GPC), based on the relationship between the molecular weight of polystyrene and retention time (retention time) to create a standard curve.
[0383] The sample was diluted to 1.0% by mass with tetrahydrofuran, passed through a 0.5 μm filter, and then the GPC of the sample was measured using the...
Synthetic example 1
[0411] [Synthesis Example 1: Synthesis of Ink Repellent (C1) and Preparation of Liquid (C1-1)]
[0412] At 50cm with the mixer 3 Into the three-necked flask of the above-mentioned compound (c-1) into the CF 3 (CF 2 ) 5 CH 2 CH 2 Si (OCH 3 ) 3 (manufactured by Asahi Glass Co., Ltd.) 0.5 g, Si(OC 2 h 5 ) 4 (manufactured by COLCOAT Co., Ltd.) 1.11 g, CH as the above-mentioned compound (c-5) 2 =CHCOO(CH 2 ) 3 Si (OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.63 g, (CH 3 ) 3 SiOCH 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.28 g. Next, PGME10.26g was injected|thrown-in, and the mixture was obtained.
[0413] While stirring the mixture at room temperature, 1.27 g of a 1.0% nitric acid aqueous solution was added dropwise. After completion of the dropwise addition, the mixture was further stirred for 5 hours. This liquid was set as (C1-1) liquid by 10 mass % of PGME solutions containing an ink repellent agent (C1). The fluorine-contai...
Synthetic example 2
[0414] [Synthesis Example 2: Synthesis of Ink Repellent (C2) and Preparation of Liquid (C2-1)]
[0415] Ethyl Silicate48 (manufactured by COLCOAT Co., Ltd.: Si (OC 2 h 5 ) 4 A mixture was prepared in the same manner as in Synthesis Example 1 except that 0.76 g of partial hydrolysis condensate) and 10.26 g of PGME were used instead of the above-mentioned compound (c-2).
[0416] Stirring the mixture at room temperature, 0.93 g of a 1.0% nitric acid aqueous solution was added dropwise. After completion of the dropwise addition, the mixture was further stirred for 5 hours. This liquid was set as (C2-1) liquid by 10 mass % of PGME solutions containing an ink repellent agent (C2). The fluorine-containing content (mass % of fluorine atoms) of the composition after removing the solvent of the obtained (C2-1) liquid was 18.8 mass %. In addition, the number average molecular weight (Mn) of the composition after removing the solvent of the (C2-1) liquid was 866.
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