Negative photosensitive resin composition, partition wall and optical element

A technology of photosensitive resin and composition, which is applied in the direction of optical components, optical, electrical components, etc., can solve the problems of reduced ink repellency of the partition wall, poor ink repellency of the surface of the partition wall, and poor ink affinity of the side of the partition wall, etc. Achieve the effect of good appearance, good ink repellency and good coating property

Active Publication Date: 2014-04-30
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, if the surface migration of the ink repellent agent is insufficient, there is a problem that the ink repellent agent remains inside the film, so the ink affinity of the partition wall side becomes poor. The layer migrated on the surface is thin and completely removed, and the ink repellency of the surface of the partition wall becomes poor, etc.
[0007] In addition, after development, there may be blank areas of ink due to the photosensitive resin composition remaining in the dots
In order to prevent it, dots are subjected to ultraviolet / ozone irradiation treatment before ink injection, but at this time, there is still a problem that the ink repellency of the partition wall decreases

Method used

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  • Negative photosensitive resin composition, partition wall and optical element
  • Negative photosensitive resin composition, partition wall and optical element
  • Negative photosensitive resin composition, partition wall and optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0379] Hereinafter, the present invention will be described in more detail using examples, but the present invention is not limited to these examples. In addition, Examples 1-5, 8-10 are examples, and Examples 6, 7, and 11 are comparative examples.

[0380] Each measurement was performed by the following method.

[0381] [Number average molecular weight (Mn)]

[0382] The gel of several monodisperse polystyrene polymers with different degrees of polymerization commercially available as a standard sample for molecular weight measurement was measured using a commercially available GPC measuring device (manufactured by Tosoh Corporation, device name: HLC-8320GPC) Permeation Chromatogram (GPC), based on the relationship between the molecular weight of polystyrene and retention time (retention time) to create a standard curve.

[0383] The sample was diluted to 1.0% by mass with tetrahydrofuran, passed through a 0.5 μm filter, and then the GPC of the sample was measured using the...

Synthetic example 1

[0411] [Synthesis Example 1: Synthesis of Ink Repellent (C1) and Preparation of Liquid (C1-1)]

[0412] At 50cm with the mixer 3 Into the three-necked flask of the above-mentioned compound (c-1) into the CF 3 (CF 2 ) 5 CH 2 CH 2 Si (OCH 3 ) 3 (manufactured by Asahi Glass Co., Ltd.) 0.5 g, Si(OC 2 h 5 ) 4 (manufactured by COLCOAT Co., Ltd.) 1.11 g, CH as the above-mentioned compound (c-5) 2 =CHCOO(CH 2 ) 3 Si (OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.63 g, (CH 3 ) 3 SiOCH 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.28 g. Next, PGME10.26g was injected|thrown-in, and the mixture was obtained.

[0413] While stirring the mixture at room temperature, 1.27 g of a 1.0% nitric acid aqueous solution was added dropwise. After completion of the dropwise addition, the mixture was further stirred for 5 hours. This liquid was set as (C1-1) liquid by 10 mass % of PGME solutions containing an ink repellent agent (C1). The fluorine-contai...

Synthetic example 2

[0414] [Synthesis Example 2: Synthesis of Ink Repellent (C2) and Preparation of Liquid (C2-1)]

[0415] Ethyl Silicate48 (manufactured by COLCOAT Co., Ltd.: Si (OC 2 h 5 ) 4 A mixture was prepared in the same manner as in Synthesis Example 1 except that 0.76 g of partial hydrolysis condensate) and 10.26 g of PGME were used instead of the above-mentioned compound (c-2).

[0416] Stirring the mixture at room temperature, 0.93 g of a 1.0% nitric acid aqueous solution was added dropwise. After completion of the dropwise addition, the mixture was further stirred for 5 hours. This liquid was set as (C2-1) liquid by 10 mass % of PGME solutions containing an ink repellent agent (C2). The fluorine-containing content (mass % of fluorine atoms) of the composition after removing the solvent of the obtained (C2-1) liquid was 18.8 mass %. In addition, the number average molecular weight (Mn) of the composition after removing the solvent of the (C2-1) liquid was 866.

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Abstract

Provided is a negative photosensitive resin composition which is capable of producing a partition wall that has good ink repellency and is capable of maintaining the ink repellency even after being irradiated with ultraviolet light / ozone. This negative photosensitive resin also has good coating properties so that a film, which is obtained by coating and drying the negative photosensitive resin composition when a partition wall is produced, has uniform and even film thickness and so that the surface of the film is free from agglomerates. Also provided are: a partition wall which is formed using the negative photosensitive resin composition; and an optical element. A negative photosensitive resin composition which contains an alkali-soluble resin (A), a photopolymerization initiator (B), an ink-repellent agent (C) and a solvent (D) and is characterized in that the ink-repellent agent (C) is composed of a fluorine-containing silane compound and the solvent (D) contains a solvent (D1) that has a boiling point of 165-210 DEG C in an amount of 10-100% by mass relative to the total mass of the solvent (D); and a partition wall which is formed of a cured film of the negative photosensitive resin composition so as to have a shape that divides the surface of a substrate into a plurality of compartments.

Description

technical field [0001] The present invention relates to a negative photosensitive resin composition, a partition using the same, and an optical element having the same. Background technique [0002] As for the partition wall used for the pixel part of the color filter which is an optical element, or an organic EL (Electro-Luminescence) element, the method of apply|coating a photosensitive resin composition on a board|substrate, and forming it by a photolithography technique is known. [0003] In recent years, a cost-reducing process using an inkjet method has been proposed as a method for manufacturing a pixel portion of a color filter or an organic EL element. [0004] For example, in the manufacture of color filters, after forming partition walls by photolithography, spray and apply R (red), G (green), B (blue) ink, and form pixels. [0005] In the inkjet method, it is necessary to prevent color mixing of ink between adjacent pixels. Therefore, the partition wall is req...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/075G02B5/20G03F7/004G03F7/038H01L51/50H05B33/12H05B33/22
CPCG03F7/0048G03F7/0007G03F7/027G02B5/201G03F7/0046H01L27/3246G03F7/0388G03F7/031G03F7/0757G03F7/038H10K59/122
Inventor 川岛正行高桥秀幸古川丰山田光太郎
Owner ASAHI GLASS CO LTD
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