Control method for plasma reinforced chemical meteorology deposition apparatus
A technology of meteorological deposition and enhanced chemistry, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of cumbersome, loss, equipment reliability and safety cannot be guaranteed, etc.
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[0039] The present invention will be further described in detail below in conjunction with the accompanying drawings.
[0040] The equipment involved in the present invention is constituted as follows:
[0041] like figure 1 As shown, the plasma enhanced chemical vapor deposition equipment has two chambers, the transfer chamber LL is responsible for the transfer of the wafer; the reaction chamber RC is responsible for the wafer deposition. The two cavities need to be in harmony and cooperate with each other to meet the requirements of the process indicators. Wafer transfer is to control the manipulator to complete the actions such as taking and placing the wafers. During the deposition process, the two chambers need to work in a low-pressure environment to ensure the cleanness of the deposition environment and to avoid affecting the uniformity and cleanliness of the wafer due to environmental factors.
[0042] figure 1 Middle: ROB is the robot arm; SPI is the sample fork; ...
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