Plasma reaction device for improving uniform gas distribution
A plasma and reaction device technology, which is applied in the uniform distribution of ions and semiconductor equipment manufacturing, can solve the problems of uniform distribution of unfavorable gases, reduce the flow space, and affect the uniformity of wafer processing, so as to speed up the diffusion speed and ensure uniform distribution. , improve the effect of uniform distribution
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[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0044] The following will be combined as figure 2 Shown is a detailed description of one embodiment of the invention. figure 2 A plasma reaction device according to an embodiment of the present invention is shown. In addition to the 2XX series reference designators, figure 2 shown in the corresponding figure 1 The elements in all have the same reference numerals, it should be understood that the plasma reaction device therein is only exemplary, and the p...
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