A processing method based on anisotropic homogenization of multiple isotropic materials
An anisotropic and isotropic technology, applied to the analysis of materials, material inspection products, material thermal conductivity, etc., can solve problems such as ignoring anisotropy and deviation of experimental values, so as to achieve easy acceptance and mastery, improve efficiency, and simplify Workflow Effects
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Embodiment 1
[0058] Please refer to figure 1 , figure 2 , Figure 4 , Figure 6 As shown, the polyisotropic material structure simplifies the calculation of the elastic modulus and Poisson's ratio parameters for the bilayer model:
[0059] Such as figure 2 Shown is a simplified double-layer model of multi-isotropic material structure, which exists in most electronic devices and involves the packaging process of electronic devices. A whole module is simplified into a two-layer model, which simplifies the measurement process and improves the measurement efficiency. accuracy. This double-layer structure includes a redistribution layer 211 (Re-distributed Layer RDL), a passivation layer 214 , and a chip film 213 . The elastic parameters of the redistribution layer 211 are as follows:
[0060] Elastic modulus E=110GPa, Poisson's ratio μ=0.34, coefficient of thermal expansion CTE=17ppm / ℃
[0061] The elastic parameters of the passivation layer 214 are as follows:
[0062] Elastic modul...
Embodiment 2
[0098] Please refer to image 3 , Figure 5 , Figure 7 As shown, the polyisotropic material structure simplifies the calculation of the elastic modulus and Poisson's ratio parameters of the six-layer model:
[0099] Such as image 3 Shown is a simplified six-layer model of multi-isotropic material structure. This structure exists in most electronic devices and involves the packaging process of electronic devices. A whole module is simplified into a six-layer model, which simplifies the measurement process and improves the measurement efficiency. accuracy. This six-layer structure includes a redistribution layer 211 (RDL), a passivation layer 214 , a chip film 213 , a chip 210 , and a dielectric layer 215 . The elastic parameters of the redistribution layer 211 are as follows:
[0100] Elastic modulus E=110GPa, Poisson's ratio μ=0.34, coefficient of thermal expansion CTE=17ppm / ℃
[0101] The elastic parameters of the passivation layer 214 are as follows:
[0102] Elasti...
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