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Device for activating getter by radio frequency discharge plasma and enhancing adsorption rate of getter

A plasma and radio frequency discharge technology, applied in the direction of plasma, electrical components, etc., can solve the problems of slow adsorption rate, low heat conversion efficiency, and long activation process time

Inactive Publication Date: 2021-03-30
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The present invention is made in view of the above facts, and mainly aims at the problems of low electricity and heat conversion efficiency in the activation process of traditional getters, long activation process time, slow adsorption rate of some gases after activation, etc., and its purpose is to provide a Device for activating getters and enhancing their adsorption rates with radio-frequency discharge plasma

Method used

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  • Device for activating getter by radio frequency discharge plasma and enhancing adsorption rate of getter

Examples

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Embodiment 1

[0032] The radio frequency power source used in this embodiment is 13.56MHz, and the output power is adjustable within 500W. The high-voltage output end of the RF power supply is connected to one end of the copper solenoid with a diameter of 6mm through a high-frequency coaxial line with a metal mesh on the outside, and the low-voltage output end is connected to the ground wire and connected to the copper solenoid through a wire on the other end. The copper solenoid consists of 10 turns, with an inner diameter of 40mm, and is nested and coiled outside the hollow container A of the vacuum chamber. The hollow container A is made of high-temperature-resistant quartz material. It is a hollow cylindrical structure with a thin upper end and a thicker lower end. The outer diameter of the upper end is 20mm, the wall thickness is 2mm, and the height is 50mm. It is also provided with an external interface. The outer diameter of the lower part is 40mm, the thickness of the pipe wall is ...

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Abstract

The invention relates to a device for activating a getter through radio frequency discharge plasma and increasing the adsorption rate of the getter. The device comprises a vacuum chamber, a radio frequency power supply system, a vacuumizing system assembly, an air supply system assembly and an air pressure acquisition system assembly. When the vacuum chamber obtains certain vacuum through vacuum system assemblies such as a ball valve and a mechanical pump, the gas type and the pressure intensity in the chamber are set through gas supply system assemblies such as a gas supply source and a massflow meter. When the hollow container with the built-in getter and the sealing flange are grounded and a radio frequency electric field is applied to generate plasma, the real-time change of the air pressure in the cavity is monitored through acquisition system components such as a vacuum gauge, a vacuum gauge display, a digital information acquisition card and a computer; the generated electromagnetic field and plasma effectively activate the getter and improve the getter rate.

Description

technical field [0001] The invention belongs to the field of electromagnetic and material applications, and in particular relates to a device for activating a getter by radio frequency discharge plasma and enhancing its adsorption rate. Background technique [0002] At present, industrial applications and basic scientific research in many fields need to be carried out in a vacuum environment, including coating, heat treatment, micro-electromechanical systems, surface science, atomic physics, nanotechnology and semiconductor industry. For vacuum technology, the internal vacuum environment and vacuum degree directly affect the working range and efficiency, especially after entering the 21st century, with the continuous improvement of various application indicators and the deepening of basic discipline research, its operation and research All environments require different degrees of high vacuum or even ultra-high vacuum to maintain, which also puts forward higher requirements ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/46
CPCH05H1/46
Inventor 石文波杨亮刘本康李庆伟耿自才周灿华李永钊回晓康金玉奇
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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