Application of two-dimensional carbon titanate in generating atmospheric pressure uniform dielectric barrier discharge

A dielectric barrier discharge and barrier discharge technology, applied in electrical components, plasma and other directions, can solve problems such as difficulty in uniform DBD, and achieve the effect of increasing the density of seed electrons and improving the uniformity of discharge

Active Publication Date: 2021-04-06
SHENZHEN UNIV
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Problems solved by technology

[0006] The purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, to provide a Ti 3 C 2 T x Application in Generating Atmospheric Air Uniform DBD and Based on Ti 3 C 2 T x Uniform DBD generating device and method to solve the relatively difficult technical problem of achieving uniform DBD in the existing atmospheric pressure air

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  • Application of two-dimensional carbon titanate in generating atmospheric pressure uniform dielectric barrier discharge
  • Application of two-dimensional carbon titanate in generating atmospheric pressure uniform dielectric barrier discharge
  • Application of two-dimensional carbon titanate in generating atmospheric pressure uniform dielectric barrier discharge

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[0023] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0024] It should be understood that in various embodiments of the present application, the sequence numbers of the above-mentioned processes do not mean the order of execution, and some or all steps may be executed in parallel or sequentially, and the execution order of each process shall be based on its functions and The internal logic is determined and should not constitute any limitation to the implementation process of the embodiment of the present application.

[0025] Terms used in the embodiments of the present application are only for the purpose of describing specific embodiments, ...

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Abstract

The invention discloses an application of a two-dimensional material Ti3C2Tx in generation of uniform dielectric barrier discharge under an atmospheric pressure air condition. The invention also discloses a dielectric barrier discharge device and method based on the application of Ti3C2Tx in generating uniform dielectric barrier discharge. Ti3C2Tx is arranged on the inner surface of the dielectric barrier discharge device. Ti vacancies exist on the surface of Ti3C2Tx, functional groups are distributed on the surface of Ti3C2Tx, and a weak electron bound state can be formed. The existence of the weak electron bound state can increase the electron density of the seeds, so that the uniformity of atmospheric pressure air dielectric barrier discharge is improved under the condition of a low-frequency power supply.

Description

technical field [0001] The invention relates to a low-temperature plasma generation technology at atmospheric pressure, in particular to a two-dimensional material Ti 3 C 2 T x Application in generating uniform dielectric barrier discharge, discharge device and method for generating uniform dielectric barrier discharge. Background technique [0002] Atmospheric pressure low-temperature plasma has a macroscopic performance of room temperature and contains a variety of high-energy active particles, which can be effectively applied to material surface treatment, nanomaterial synthesis, and biomedical applications. Dielectric barrier discharge (DBD) is a low-temperature plasma generation method with great industrial application prospects due to its simplicity, effectiveness, and scalability. However, since the air contains electronegative oxygen molecules, it can reduce the content of metastable nitrogen molecules and adsorb free electrons, resulting in a decrease in the seed...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
CPCH05H1/2406
Inventor 王任衡崔伟胜钱正芳林俏露孙一翎范姝婷
Owner SHENZHEN UNIV
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