The invention relates to a double-layer sleeve type corona plasma generating device comprising a gas buffering chamber, an outer-layer processing chamber and an inner-layer processing chamber. A gas inlet is provided on the outer side of the gas buffering chamber. An insulation baffle is provided on the inner side of the buffering chamber. Airway through holes are provided on the baffle. Gas to be processed sequentially enters the outer-layer processing chamber and the inner-layer processing chamber through the airway through holes. When the gas is completely processed, the gas is discharged from a gas outlet connected to an end of the inner-layer processing chamber. According to the invention, with the buffering chamber, the gas to be processed can be uniformly and stably delivered in the processing chambers. The chambers adopt a coaxial multi-pin-plate structure, such that electric field unevenness coefficient is high, discharge voltage is low, and thus operation energy consumption is reduced. Also, voltage adjustable range is wide, and application scope is wide. With the inner-outer double layer structure, low temperature plasma dedusting and waste gas degradation are separated, such that the influence of dust in waste gas to waste gas molecule degradation is avoided, and energy utilization rate is improved. Also, reactor structure is compact. The device provided by the invention is suitable for the fields such as waste gas treatment, sterilization and disinfection, ozone synthesis, and the like.