Double-layer sleeve type corona plasma generating device

A plasma and generating device technology, applied in the field of ion generating devices, can solve the problems of high energy consumption for single-stage reactor processing, complex industrial waste gas composition, wide equipment footprint, etc., and achieves compact structure and electric field non-uniformity coefficient. The effect of large and small operating energy consumption

Active Publication Date: 2014-11-05
XI AN JIAOTONG UNIV
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Problems solved by technology

[0004] At present, the bottleneck problem that restricts the large-scale application of corona plasma in industrial waste gas treatment is: the composition of industrial waste gas is complex, in addition to containing various types of toxic and harmful inorganic or organic waste gas molecules, it often also contains a large amount of aerosols, droplets, dust, etc. Dirty particles, the energy consumption of single-stage reactor is too high, and the long-term violent discharge will seriously damage the reactor, while multi-stage reactors also have high energy consumption, large equipment footprint, and investment in large-scale industrial applications. Large and other disadvantages

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  • Double-layer sleeve type corona plasma generating device
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  • Double-layer sleeve type corona plasma generating device

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Embodiment Construction

[0027] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0028] see Figure 1 to Figure 4 , a double-layer sleeve type corona plasma generating device of the present invention includes a metal base 18 and an outer metal sleeve 9 arranged on the metal base 18, and the top of the outer metal sleeve 9 is sequentially provided with insulating baffles 10 and an outer insulating shell 19, the center of the insulating baffle 10 is provided with a through hole, and a number of air passage holes 11 are evenly opened in the upper direction of the insulating baffle 10; the inner metal sleeve 8 passes through the insulating baffle The central through hole of the plate 10 is fixed on the insulating baffle 10, a number of needle electrodes 7 are arranged on the side wall of the inner metal sleeve 8, and the number of needle electrodes 7 are perpendicular to the side wall of the inner metal sleeve 8, The inner ground electrode 6...

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Abstract

The invention relates to a double-layer sleeve type corona plasma generating device comprising a gas buffering chamber, an outer-layer processing chamber and an inner-layer processing chamber. A gas inlet is provided on the outer side of the gas buffering chamber. An insulation baffle is provided on the inner side of the buffering chamber. Airway through holes are provided on the baffle. Gas to be processed sequentially enters the outer-layer processing chamber and the inner-layer processing chamber through the airway through holes. When the gas is completely processed, the gas is discharged from a gas outlet connected to an end of the inner-layer processing chamber. According to the invention, with the buffering chamber, the gas to be processed can be uniformly and stably delivered in the processing chambers. The chambers adopt a coaxial multi-pin-plate structure, such that electric field unevenness coefficient is high, discharge voltage is low, and thus operation energy consumption is reduced. Also, voltage adjustable range is wide, and application scope is wide. With the inner-outer double layer structure, low temperature plasma dedusting and waste gas degradation are separated, such that the influence of dust in waste gas to waste gas molecule degradation is avoided, and energy utilization rate is improved. Also, reactor structure is compact. The device provided by the invention is suitable for the fields such as waste gas treatment, sterilization and disinfection, ozone synthesis, and the like.

Description

technical field [0001] The invention belongs to the technical field of low-temperature plasma environment application, and in particular relates to a double-layer sleeve type corona plasma generating device. Background technique [0002] With the continuous expansion of human production activities and living activities, the amount and types of "three wastes" wastes are increasing rapidly. Pollution not only causes serious damage to the ecological environment, but also brings immeasurable harm to human beings themselves. It is especially worth pointing out that, with the frequent occurrence of smog weather across the country in recent years, people's daily life and physical and mental health have been seriously affected, one of the main sources of smog - the treatment of industrial waste gas has also been raised to the national development strategic heights. However, the traditional waste treatment technologies such as physical, chemical treatment and combustion are far fro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/32B01D49/00
Inventor 张冠军廖文龙常正实穆海宝邓军波赵景联
Owner XI AN JIAOTONG UNIV
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