Apparatus for generating low temperature plasma at atmospheric pressure

A low-temperature plasma and atmospheric pressure technology, applied in the direction of plasma, chemical/physical/physicochemical processes of energy application, electrical components, etc., can solve problems such as expensive, difficult power supply operation and control, and high power consumption

Inactive Publication Date: 2004-04-21
SE PLASMA
View PDF0 Cites 25 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this power supply is difficult to operate and control because it is expensive and consumes a lot of power

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apparatus for generating low temperature plasma at atmospheric pressure
  • Apparatus for generating low temperature plasma at atmospheric pressure
  • Apparatus for generating low temperature plasma at atmospheric pressure

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0024] refer to figure 1 , which shows a cross-sectional view of an electrode structure suitable for the device for generating low-temperature plasma under atmospheric pressure according to the first embodiment of the present invention. In this embodiment, the present invention utilizes a plate-structured electrode to generate a low-temperature plasma at atmospheric pressure.

[0025] like figure 1 As shown, the device according to the invention has a pair of electrodes 1 and 2 arranged opposite to each other. One of these two electrodes is connected to a power source 6, while the other electrode is grounded. When the power supply 6 provides direct current, the ground electrode is the anode 2 , and the electrode connected to the power supply 6 is set as the cathode 1 . Preferably, both electrodes are made of metal, such as stainless steel, aluminum or copper.

[0026] Dielectrics 3 and 4 are mounted on electrodes 1 and 2, respectively, and arranged to face each other. In ...

no. 2 example

[0036] refer to figure 2, which shows a cross-sectional view of an electrode structure suitable for use in an apparatus for generating low-temperature plasma at atmospheric pressure according to another embodiment of the present invention. In this embodiment, the present invention uses a tube-structured electrode in a device capable of generating low-temperature plasma at atmospheric pressure.

[0037] like figure 2 As shown, a tubular electrode 1' is provided on the inner periphery of which a dielectric 3' is mounted. A cylindrical core electrode 2' concentric with the tubular electrode 1' is arranged along the central axis of the tubular electrode 1' at a distance from a dielectric 3' mounted on the inner surface of the tubular electrode 1'. Both ends of each electrode are fixed with suitable insulation (not shown), the anode dielectric 4' is fixed on the outer periphery of the core electrode 2', and a plurality of discharge gaps 7' are equally spaced in the anode dielec...

Embodiment

[0047] This embodiment adopts the same plasma manufacturing apparatus as that of the second embodiment, which has a plate structure, wherein two electrode plates 1 and 2 are arranged to face each other, and provided on the respective opposing surfaces of the electrode plates 1 and 2 There is a dielectric. A plurality of discharge gaps 7 are formed in one dielectric 3 and 4, and each discharge gap 7 has a width of 200 μm and a height of 2 mm. For conductor electrodes 5, there are provided shapes such as Figure 3a For the tips 8 shown in , each tip 8 has a width (a) of 2 mm and a height (b) of 1.5 mm. Helium gas was introduced between the two electrodes 1 and 5 at a distance of 7mm from each other, and at the same time, a 50KHz DC bipolar pulse power supply was applied between the electrodes to discharge under atmospheric pressure.

[0048] As a result, a voltage of about 1KV was used to induce discharge, while a sustain voltage was about 0.7KV. At this time, high-density pl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to view more

Abstract

Disclosed is an apparatus for generating low-temperature plasma at atmospheric pressure, comprising: a couple of electrodes facing each other at a distance, one of them being connected to a power supply, the other being grounded; a couple of dielectrics with a thickness of 25 mum to 10 mm, positioned on the facing surfaces of the electrodes in such away as to face each other, one of them having at least one discharge gap therein; and a conductor electrode having at least one tip positioned within the discharge gap, wherein an electric field is applied at an intensity of 1-100 KV/cm through the power supply across the electrodes by use of a pulse direct current or an alternating current in a frequency bandwidth of 50 Hz to 10 GHz while a reaction gas is fed between the electrodes, so as to induce a hollow cathode discharge, a capillary discharge or the high accumulation of charges from the discharge gap. The inventive apparatus prevents the conversion of the plasma to arcs and thus gives stable, low-temperature plasma in a high density.

Description

technical field [0001] The present invention relates to a device for generating high-density low-temperature plasma at atmospheric pressure with low discharge initiation and maintenance voltages. Background technique [0002] In general, a plasma is defined as a partially ionized gas consisting of approximately equal amounts of positive and negative free charges, so it is electrically neutral. Depending on the temperature at which ionization is performed, plasmas are divided into high-temperature plasmas and low-temperature plasma subgroups, and plasmas are chemically and physically highly reactive. [0003] Low-temperature plasma is used to synthesize various materials such as metals, semiconductors, polymers, nylon, plastics, paper, fibers, and ozone, or to modify the surface properties of materials while improving various physical and chemical properties such as connection strength, dyeing properties , printability, etc. Therefore, low-temperature plasma has multiple us...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24B01J19/08C23C16/503H01J37/32H05H1/48
CPCH01J37/32036H01J37/32009H01J37/32018H05H1/48
Inventor 南基锡李相老李九铉罗钟周金钟国
Owner SE PLASMA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap