Apparatus for generating low temperature plasma at atmospheric pressure
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SE PLASMA
- Publication Date
- 2004-04-21
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to a device for generating high-density low-temperature plasma at atmospheric pressure with low discharge initiation and maintenance voltages. Background technique
[0002] In general, a plasma is defined as a partially ionized gas consisting of approximately equal amounts of positive and negative free charges, so it is electrically neutral. Depending on the temperature at which ionization is performed, plasmas are divided into high-temperature plasmas and low-temperature plasma subgroups, and plasmas are chemically and physically highly reactive.
[0003] Low-temperature plasma is used to synthesize various materials such as metals, semiconductors, polymers, nylon, plastics, paper, fibers, and ozone, or to modify the surface properties of materials while improving various physical and chemical properties such as connection strength, dyeing properties , printability, etc. Therefore, low-temperature plasma has multiple us...