Wafer-level packaging process and wafer-level packaging structure
A wafer-level packaging and process technology, which is applied in the manufacturing of electrical components, electrical solid-state devices, and semiconductor/solid-state devices, etc., can solve the problems of limited thickness, contamination of the functional area 102', and increased defective product rate of wafer packaging structures, etc. Achieve the effect of not easy to contaminate, good packaging effect and high yield
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Embodiment 1
[0050] This embodiment provides a wafer-level packaging process, which can be used to package the wafer 100 . The wafer 100 includes a substrate 101 on which a plurality of functional areas 102 are distributed in a matrix, and each functional area 102 is provided with welding pads 103 around it. The wafer-level packaging process of this embodiment is especially suitable for packaging the wafer 100 whose size of the functional area 102 is not smaller than 3mm×5mm.
[0051] Such as Figure 4-Figure 8 shown (where Figure 5-Figure 8 Only the structure within a functional area 102 on the wafer 100 is shown), the wafer level packaging process includes steps:
[0052] Such as Figure 5 and Figure 6 As shown, a support cofferdam 3 is made on the cover plate 2 to form a plurality of grooves 5 distributed in a matrix. The support cofferdam 3 includes edges for surrounding the grooves 5, and the inner ends of the edges are recessed Serrated segment 31;
[0053] Such as Figure 7...
Embodiment 2
[0063] The difference between this embodiment and the first embodiment is that the covering plate 2 and the supporting cofferdam 3 are formed integrally, the covering plate 2 is a silicon chip, and a groove 5 is provided on one side of the covering plate 2 to form the supporting cofferdam 3 . Specifically, the step of opening the groove 5 on the cover plate 2 includes: using photolithography to form a region to be grooved on the surface of the silicon wafer; Grooves 5 are etched to form support dams 3 . Of course, in other embodiments, the groove 5 can also be made by laser ablation method directly on the silicon wafer, and the steps are simpler.
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Abstract
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