Device and method for preventing crystallization of deposition gas in laser chemical vapor deposition

A technology of chemical vapor deposition and deposition gas, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., and can solve problems such as pipeline blockage, non-disclosure, economic loss, etc.

Pending Publication Date: 2021-04-20
苏州科韵激光科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, metal source gases are generally organic gases containing metal elements, such as chromium hexacarbonyl (Cr(CO) 6 ), it is very easy to freeze and solidify in the pipeline or on the substrate to form crystals, causing serious problems such as pipeline blockage or substrate scrapping, resulting in huge economic losses. For this problem, the prior art does not disclose any technical solutions

Method used

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  • Device and method for preventing crystallization of deposition gas in laser chemical vapor deposition
  • Device and method for preventing crystallization of deposition gas in laser chemical vapor deposition
  • Device and method for preventing crystallization of deposition gas in laser chemical vapor deposition

Examples

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Comparison scheme
Effect test

Embodiment 1

[0045] This embodiment provides a device and method for preventing crystallization of deposition gas in laser chemical vapor deposition, such as figure 1 and figure 2 As shown, the device includes: a deposition gas storage container 1, which is used to supply the deposition gas required for laser chemical vapor deposition; a reaction chamber 2, which is used to carry out the laser chemical vapor deposition process; a pipeline 3, which communicates with the deposition gas The storage container 1 and the reaction chamber 2 are used to transport the deposition gas from the deposition gas storage container 1 to the reaction chamber 2. Along the flow direction of the deposition gas, the pipeline 3 includes five temperature loss regions 31; a temperature maintaining device 4, which is arranged along the pipeline 3, and is used to keep the deposition gas in the pipeline 3 in a continuous gasification state, and the temperature maintaining There are five devices 4, which are corresp...

Embodiment 2

[0050] This embodiment provides a device and method for preventing the crystallization of deposition gas in laser chemical vapor deposition, which is the same as that of Embodiment 1. figure 1 and figure 2 Similarly, the device includes: a deposition gas storage container 1 for supplying the deposition gas required for laser chemical vapor deposition; a reaction chamber 2 for carrying out the laser chemical vapor deposition process; a pipeline 3 connected to the deposition gas storage The container 1 and the reaction chamber 2 are used to transport the deposition gas from the deposition gas storage container 1 to the reaction chamber 2. Along the flow direction of the deposition gas, the pipeline 3 It includes seven temperature loss areas 31; a temperature maintaining device 4, which is arranged along the pipeline 3, and is used to keep the deposition gas in the pipeline 3 in a continuous gasification state, and the temperature maintaining device 4 is seven, which are corres...

Embodiment 3

[0055] This embodiment provides a device and method for preventing the crystallization of deposition gas in laser chemical vapor deposition, which is the same as that of Embodiment 1. figure 1 and figure 2 Similarly, the device includes: a deposition gas storage container 1 for supplying the deposition gas required for laser chemical vapor deposition; a reaction chamber 2 for carrying out the laser chemical vapor deposition process; a pipeline 3 connected to the deposition gas storage The container 1 and the reaction chamber 2 are used to transport the deposition gas from the deposition gas storage container 1 to the reaction chamber 2. Along the flow direction of the deposition gas, the pipeline 3 It includes three temperature loss areas 31; a temperature maintaining device 4, which is arranged along the pipeline 3, and is used to keep the deposition gas in the pipeline 3 in a continuous gasification state, and the temperature maintaining device 4 is three, which are corres...

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PUM

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Abstract

The invention relates to a device and a method for preventing crystallization of deposition gas in laser chemical vapor deposition. The device comprises a deposition gas storage container, a reaction cavity and a pipeline connecting the deposition gas storage container and the reaction cavity and used for conveying the deposition gas, and the pipeline comprises at least two temperature loss areas in the flow direction of the deposition gas. Corresponding to the temperature loss areas, the device is further provided with a temperature maintaining device and a first temperature monitoring device, and the monitoring target temperature of the first temperature monitoring device is in an increasing trend. By means of the device, the deposition gas in the pipeline can be kept in a continuous gasification state, the phenomenon that the deposition gas is solidified and crystallized when meeting cold in the pipeline or on a base plate in the reaction cavity is effectively prevented, the serious problems that the pipeline is blocked or the base plate is scrapped are effectively avoided, and huge economic losses are effectively avoided.

Description

technical field [0001] The invention relates to the technical field of laser chemical vapor deposition, in particular to a device and method for preventing crystallization of deposition gas in laser chemical vapor deposition. Background technique [0002] Laser Chemical Vapor Deposition (LCVD) is a method in which the photon energy of a laser beam is used to excite and promote the reaction of chemical gases or vapors on the surface of a substrate to synthesize coatings or nanomaterials. At present, LCVD is mainly used as a repair method, mainly for repairing defects such as broken wires on a display substrate. For example, CN103744201A discloses a repair method and a repair system of a liquid crystal display panel. The repair method includes the following steps: step 1, providing a liquid crystal display panel, the circuit on the liquid crystal display panel has an open circuit; step 2, by laser chemical vapor deposition Form graphene on the liquid crystal display panel to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/52C23C16/455C23C16/44
Inventor 杨军董岱王天一
Owner 苏州科韵激光科技有限公司
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