Tin drop detection and recovery device

A recycling device and tin drop technology, applied in the field of lithography machines, can solve the problems of tin drop emission angle deviation, affecting the efficiency of lithography machines, unable to effectively generate extreme ultraviolet radiation, etc., to achieve the effect of improving the recycling rate

Active Publication Date: 2021-04-23
SHANGHAI INTEGRATED CIRCUIT EQUIP & MATERIALS IND INNOVATION CENT CO +1
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] but in the attached figure 1 In the existing structure described above, when the spout of the tin droplet is blocked by semi-solidified residual tin or the accumulation of impurities in the tin, the emission angle of the tin droplet will be shifted, and the deflected tin droplet cannot be accurately detected by the pulsed laser. 1 focus, it will not be able to effectively

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Tin drop detection and recovery device
  • Tin drop detection and recovery device
  • Tin drop detection and recovery device

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0039]Example 1

[0040]Such asFigure 4As shown, there are four piezoelectric ceramics in the tin drop detector, and the position of the tin droplets is determined by the voltage value of the piezoelectric ceramic, and the piezoelectric ceramics are electrically thinned and the substrate is sandwiched in four angles. Such asFigure 4Indicated. For the position of three tin drops, the principle of piezoelectric ceramic detection and the position adjustment of the tin droplets are described, including the entire stainless steel plate being four parts, respectively, B, C, D, piezoelectric ceramics pass the preamplifier The measured voltage signal is VA, VB, VC, VD:

[0041]When tin drop is in position 1: VA1= VB1= VC1= VD1It is illustrated that tin droplets are in a square center consisting of four piezoelectric ceramics, there is no need to adjust the tin jet.

[0042]When tin drop is in position 2: VA2> VB2= VC2= VD2It is illustrated that tin droplets are biased towards one of the piezoelectri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a tin drop detection and recovery device which comprises a tin drop emitter, a tin drop recoverer and a tin drop receiver; the tin drop emitter is used for emitting tin drops drop by drop; tin drops reach the tin drop recoverer through the bounce of the tin drop receiver; the tin drop receiver comprises a substrate, a receiving plate located below the substrate and piezoelectric ceramics located between the substrate and the receiving plate; the piezoelectric ceramics are evenly distributed around the substrate and the receiving plate; the substrate and the receiving plate are in central symmetry patterns. and the tin drop emitter and the tin drop recoverer are symmetrically located on the two sides of the center normal of the tin drop receiver. The tin drop detection and recovery device provided by the invention can ensure that tin drops emitted by the tin drop emitter do not deviate.

Description

technical field [0001] The invention belongs to the field of photolithography machines, in particular to a tin drop detection and recovery device. Background technique [0002] At present, the mainstream extreme ultraviolet (Extremely Ultra-Violet, EUV) lithography machine adopts a laser-produced plasma (Laser Produced Plasma, LPP) light source, and the target material adopts tin (Sn). as attached figure 1 As shown, in the existing photolithography machine, tin is heated to a molten state by a heating device and ejected drop by drop by a tin drop emitter 8 . The pulsed laser 1 (generally carbon dioxide gas laser) is focused into a pulsed laser beam 2 by a focusing lens. The pulsed laser beam 2 is focused on the tin droplet 3, and the tin droplet is heated to a plasma state to generate extreme ultraviolet radiation 11 including 13.5nm. The ejection frequency of tin droplets is generally 50-200kHz, and the speed of tin droplets is usually ≥30m / s, which is synchronized with t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H05G2/00
CPCH05G2/00
Inventor 李艳丽伍强
Owner SHANGHAI INTEGRATED CIRCUIT EQUIP & MATERIALS IND INNOVATION CENT CO
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products