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Synthesis of trichlorosilane from tetrachlorosilane and hydridosilanes

A technology of trichlorosilane and tetrachlorosilane, applied in the direction of silicon compounds, halogenated silanes, halogenated silicon compounds, etc., can solve the problems of low yield and high reaction temperature, and achieve the effect of high quality and high economic value

Pending Publication Date: 2021-05-25
MOMENTIVE PERFORMANCE MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Many works have been carried out on the following aspects: Hydrodehalogenation of chlorosilanes in the presence of metal silicides (H.Walter, G.Roewer, K.Bohmhammel, J.Chem.Soc.Faraday Trans.1996,92,4605- 4608), but for HSiCl 3 The recovered reaction temperature is high (~600°C) and the yield is low (conversion SiCl 4 / HSiCl 3 4-7 mole %)

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  • Synthesis of trichlorosilane from tetrachlorosilane and hydridosilanes
  • Synthesis of trichlorosilane from tetrachlorosilane and hydridosilanes
  • Synthesis of trichlorosilane from tetrachlorosilane and hydridosilanes

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Embodiment Construction

[0122] The invention is further illustrated by the following examples without being limited thereto.

[0123] summary

[0124] To obtain organohydrogensilanes as starting materials, by using conventional reducing agents such as metal hydrides MH or MH 2 (M = alkali metal, alkaline earth metal), or complex metal hydride (LiAlH 4 , NaBH 4 、i-Bu 2 AlH, etc.) or a mixture thereof is hydrogenated (reduced) in an ether (such as diethyl ether, di-n-butyl ether, diglyme, 1,4-dioxane or a mixture thereof) as a solvent, and Chlorosilanes, especially organochlorosilanes R 3 SiCl, R 2 SiCl 2 and RSiCl 3 (R = alkyl, aryl, alkenyl) conversion, especially into their corresponding organomono-, di- and trihydrosilanes R 3 SiH, R 2 SiH 2 and RSiH 3 . The use of sodium hydride is preferred and attractive due to safety and economical issues, but it reduces chlorosilanes only under severe conditions such as high temperatures of about 250°C [A.R. Gilbert, G.D. Cooper, R.W. Shade, Indu...

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Abstract

The invention relates to a process for the preparation of trichlorosilane (HSiCI3) which comprises the reaction of tetrachlorosilane (SiCU) with hydridosilanes in the presence of a catalyst.

Description

Background technique [0001] Trichlorosilane is conventionally produced by treating powdered metallurgical grade silicon at 300°C with hydrogen chloride sparging: [0002] Si+3 HCl→HSiCl 3 +H 2 . [0003] Yields of 80-90% can be achieved. It is an important intermediate in the production of solar silicon, in which trichlorosilane is distilled in a complex process and decomposed into silicon, silicon tetrachloride and hydrogen chloride on heated rods of ultrapure silicon: [0004] 2 HSiCl 3 →Si+SiCl 4 +2 HCl. [0005] Trichlorosilane is also produced from silicon tetrachloride at T=500°C: [0006] 3 SiCl 4 +Si+2H 2 →4 HSiCl 3 (+H 2 SiCl 2 +HCl) [0007] (Thermodynamically limited yield was 20%). [0008] In the Bayer Process (Bayer Process), make SiCl 4 Reaction with activated carbon or activated carbon-supported transition metals and barium as a promoter at T=600-900°C, SiCl 4 / HSiCl 3 Conversion was -15%. [0009] For the reaction SiCl 4 +H 2 →HSiCl 3 +HCl...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCC01B33/1071B01J14/005B01J23/72
Inventor N.奥纳A.G.斯特姆
Owner MOMENTIVE PERFORMANCE MATERIALS INC