Lithography machine matching method based on BFGS quasi-Newton-interior point algorithm

Abstract

The invention discloses a photoetching machine matching method based on a BFGS quasi-Newton-interior point algorithm. According to the method, the key size of a space image is used as a parameter for describing the imaging performance of the photoetching machine, a photoetching machine illumination light source described in a parameterized mode and the numerical aperture of a projection objective lens are optimized through a BFGS quasi-Newton-interior point algorithm, and high-efficiency matching of the photoetching machine is achieved. According to the method, constraints are added to the optimization problem by utilizing the barrier function, iteration information is effectively utilized, the matching method of the non-free illumination system photoetching machine is improved, and the matching precision and efficiency of an existing method are improved. The method is suitable for matching between immersion lithography machines with non-free illumination systems.

Description

technical field [0001] The invention relates to a lithography machine, in particular to a lithography machine matching method based on a BFGS quasi-Newton-interior point algorithm. Background technique [0002] Photolithography is the core process of integrated circuit manufacturing. In order to reduce economic and time costs, lithography processes are usually developed on reference lithography machines. The new photolithography process needs to be applied to the production line when the chip is mass-produced. Usually there are multiple lithography machines on a production line, and their models and suppliers may be different, and the performance of different types of lithography machines generally varies. Even lithography machines of the same model may have large differences in lithography performance including imaging quality due to slight differences in their hardware indicators. Differences between different lithography machines will lead to differences in their perfo...

AI Technical Summary

Problems solved by technology

In fact, in the process of matching by adjusting the light source of the lithography machine, the parameters of the light source can only be adjusted within a limited range, and the Newton method or the least square method used in the aforementioned technology is usually used to solve unconstrained optimization problems , there is a possibility of information loss during the algorithm iteration, which affects the iteration speed

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