Low-dielectric-constant polyhedral oligomeric silsesquioxane/epoxy resin nano composite material and preparation method thereof
A technology of polysilsesquioxane and nanocomposite materials, which is applied in the field of integrated circuits, can solve the problems of not reaching low dielectric constant materials, etc., and achieve the effects of excellent reactivity, lower dielectric constant, and fast curing speed
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[0034] Example An epoxy resin nanocomposite of a low dielectric constant was prepared from the following method:
[0035] (1), prepare materials:
[0036] The bisphenol A epoxy resin E51103G is specifically a South sub-epoxy 128 resin;
[0037] Nanoparticles 50g; nanoparticles are methacryloxypropyl cage (POS, POSS, POLYHEDRAL OLIGOMERIC SILSESQUIOXANES);
[0038] 48g of the open loop, the open loop agent is methacrylic acid;
[0039] Catalyst 0.44 g, catalyst is triphenylphosphine;
[0040] Diluent 28g, diluent is a hydroxyethyl methacrylate;
[0041] Photo initiator, photoinitiator is 2,4,6-trimethylbenzoyl-diphenyl oxide.
[0042] (2), epoxy resin modification
[0043] 103 g of bisphenol A epoxy resin was added to the three flasks, warmed to 80 ° C, stirred at 150 r / min, and 48 g of methacrylic acid was added thereto, and then the temperature was 10 ° C, and then added to it four times. Trobhenylphosphine catalyst, each time plus 0.1 g, 0.1 g, 0.12 g, 0.12g, and each time it ...
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