Implanted instrument surface and manufacturing method thereof
A manufacturing method and device technology, which are applied to the surface of implanted devices and the field of manufacturing thereof, can solve the problems of poor microstructure surface uniformity, affect the function of the microstructure surface, affect the surface structure of the microstructure, etc., so as to increase the superhydrophobicity, Guaranteed stability and uniformity, improved hydrophobicity
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Embodiment 1
[0032] This embodiment discloses a method for manufacturing the surface of an implanted device, comprising the following steps,
[0033] S1: Use diamond polishing abrasive grains or alumina polishing grains with a particle size of 0.3μm to polish the surface of the metal instrument at a line speed of 4m / s and a pressure of 0.1MPa. The polishing time is 20min. Polish the surface of the metal instrument. The surface roughness of the final instrument is Ra<0.1μm.
[0034] S2: Using a femtosecond laser to etch the surface of the device polished by S1 to etch a microstructure surface, the microstructure surface has microstructures of at least two sizes, preferably, the microstructure surface is composed of an ordered submicron structure The surface is composed of a surface with a disordered nanoparticle structure, and further preferably, the ordered submicron structure surface includes a square groove structure and a rhombic groove structure. Wherein, during the etching of the fem...
Embodiment 2
[0038] This embodiment discloses a method for manufacturing the surface of an implanted device, comprising the following steps,
[0039] S1: Use diamond polishing abrasive grains or alumina polishing grains with a particle size of 6 μm to polish the surface of metal instruments at a linear speed of 7 m / s and a pressure of 0.4 MPa. The polishing time is 20 to 40 minutes. The roughness of the polished instrument surface Degree Ra<0.1μm.
[0040] S2: Using a femtosecond laser to etch the surface of the device polished by S1 to etch a microstructure surface, the microstructure surface has microstructures of at least two sizes, preferably, the microstructure surface is composed of an ordered submicron structure The surface is composed of a surface with a disordered nanoparticle structure, and further preferably, the ordered submicron structure surface includes a square groove structure and a rhombic groove structure. Wherein, during the etching of the femtosecond laser, the laser ...
Embodiment 3
[0044] This embodiment discloses a method for manufacturing the surface of an implanted device, comprising the following steps,
[0045] S1: Use diamond polishing abrasive grains or alumina polishing grains with a particle size of 0.5μm to polish the surface of the metal instrument at a line speed of 5m / s and a pressure of 0.3MPa. The polishing time is 30min. Polish the surface of the metal instrument. The surface roughness of the final instrument is Ra<0.1μm.
[0046] S2: Using a femtosecond laser to etch the surface of the device polished by S1 to etch a microstructure surface, the microstructure surface has microstructures of at least two sizes, preferably, the microstructure surface is composed of an ordered submicron structure The surface is composed of a surface with a disordered nanoparticle structure, and further preferably, the ordered submicron structure surface includes a square groove structure and a rhombic groove structure. Wherein, during the etching of the fem...
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