Method for cleaning micro-nano particle pollutants through laser and application

Abstract

The invention discloses a method for cleaning micro-nano particle pollutants through laser and application. The method is obtained through a laser cleaning model. The cleaning model is constructed by the following models: an intensity distribution model of light field at a substrate interface including a pollutant particle modulation effect, a temperature distribution model at the substrate interface including a non-uniform temperature distribution phenomenon caused by the pollutant particle modulation effect, a thermal stress distribution model at the substrate interface including thermal stress change caused by temperature change and a luminous force distribution model at the substrate interface. By establishing the three-dimensional cleaning model including a scattering light field, a temperature field, a thermal power field and an electromagnetic field, an optimal scheme for cleaning the transparent substrate micro-nano particles can be obtained.

Description

technical field [0001] The invention relates to the technical field of laser cleaning. Background technique [0002] In a large-scale high-power laser device, the optical components will be greatly reduced after they are polluted by pollutants, which can easily cause damage to the optical components. Existing studies have pointed out that nano-scale pollutants are the main cause of laser damage in the ultraviolet band, so the removal of nano-scale particles is the common goal of many technologies. However, traditional cleaning is not only easy to damage the substrate, but also difficult to apply traditional cleaning techniques to nanoscale particles. To solve this problem, some existing technologies have proposed laser cleaning methods. [0003] Laser cleaning technology is a non-mechanical contact surface cleaning technology, which has the advantages of high cleaning efficiency, low pollution, and wide application range, and has been widely used in the industrial field. H...

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Problems solved by technology

At the same time, the imperfection of laser cleaning mechanism is also one of the reasons that limit its development.

For example, in 2006, Francesco Bloisi et al. proposed a one-dimensional model to describe the back-facing laser cleaning technology, which is used to remove particles on the substrate. However, the mechanism is only focused on the one-dimensional model, and the scattering field and three-dimensional thermal expansion model of the particles are not detailed. description of

In 2001, Y.W.Zheng and others were studying the effect of laser on Sio 2 In the process of particle cleaning, the corresponding cleaning threshold is obtained based on the three-dimensional thermal expansion effect mechanism, but the electromagnetic force is not discussed

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