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Preparation method of PVT method silicon carbide crystal growth raw material

A technology of crystal growth and silicon carbide, applied in the direction of crystal growth, single crystal growth, single crystal growth, etc., can solve the problems affecting the quality of crystal growth, uneven proportion, crystal polytype, etc., to ensure the excessive sublimation of silicon, the proportion of uniform effect

Active Publication Date: 2021-10-08
哈尔滨科友半导体产业装备与技术研究院有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In order to solve the PVT silicon carbide crystal growth process in the prior art, due to the uneven ratio of Si and C elements in the growth raw materials, the crystals are polymorphic, and the defects of carbon inclusions seriously affect the quality of the crystal growth in the later stage. The invention provides a method for preparing silicon carbide crystal growth raw materials by PVT method

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  • Preparation method of PVT method silicon carbide crystal growth raw material
  • Preparation method of PVT method silicon carbide crystal growth raw material

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Embodiment 1

[0025] The present invention provides a kind of preparation method of silicon carbide crystal growth raw material by PVT method, described method comprises the following steps:

[0026] First, add 10g of starch and 5g of PVA to 70g of silicon carbide powder, mix and stir well to form a silicon carbide colloid; put the colloid into a mold, and use a pressure of 20MPa to press it into a dense body; put the pressed dense body into a muffle furnace and calcined at 1200 degrees Celsius for 3 hours to obtain a silicon carbide porous ceramic body with a porosity of 30%.

[0027] Secondly, natural flake graphite was mixed with 15g of potassium permanganate and 85g of nitric acid, reacted at 60°C for 80min, dried at 39°C for 2h, and expanded at 500°C to obtain sulfur-free expanded graphite; add 40g of Si to 50g of sulfur-free expanded graphite Powder, 5gPVA, form sulfur-free expanded graphite colloid.

[0028] The mass ratio of the potassium permanganate to the nitric acid is 15-25:75...

Embodiment 2

[0031] The present invention provides a kind of preparation method of silicon carbide crystal growth raw material by PVT method, described method comprises the following steps:

[0032] First, the natural flake graphite was mixed with 20g of potassium permanganate and 80g of nitric acid, reacted at 60°C for 80min, dried at 39°C for 2h, and expanded at 550°C to obtain sulfur-free expanded graphite; 45g of Si was added to 55g of sulfur-free expanded graphite Powder, 6g PVA, form sulfur-free expanded graphite colloid.

[0033] Then, add 20g of starch and 10g of PVA to 80g of silicon carbide powder, mix and stir thoroughly to form silicon carbide colloid; put the colloid into a mold, and press it into a compact body with a pressure of 40MPa; put the compacted compact body into a muffle furnace and calcined at 1300 degrees Celsius for 4 hours to obtain a silicon carbide porous ceramic body with a porosity of 40%.

[0034] Finally, soak the obtained silicon carbide porous ceramic b...

Embodiment 3

[0036] The present invention provides a kind of preparation method of silicon carbide crystal growth raw material by PVT method, described method comprises the following steps:

[0037] First, add 15g of starch and 8g of PVA to 75g of silicon carbide powder, mix and stir thoroughly to form silicon carbide colloid; put the colloid into a mold, and press it into a compact body with a pressure of 50MPa; put the compacted compact body into a muffle furnace and calcined at 1300 degrees Celsius for 3.5 hours to obtain a silicon carbide porous ceramic body with a porosity of 50%.

[0038] Secondly, natural flake graphite was mixed with 18g of potassium permanganate and 82g of nitric acid, reacted at 60°C for 80min, dried at 39°C for 2h, and expanded at 525°C to obtain sulfur-free expanded graphite; 42g of Si was added to 53g of sulfur-free expanded graphite Powder, 5g PVA, form sulfur-free expanded graphite colloid.

[0039] Finally, soak the silicon carbide porous ceramic body in t...

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Abstract

The invention belongs to the field of silicon carbide crystals, and discloses a preparation method of a PVT method silicon carbide crystal growth raw material. The method comprises the following steps of: (1) adding starch and PVA into silicon carbide powder, and fully mixing and stirring to form a silicon carbide colloid; (2) pressing the silicon carbide colloid into a compact body; (3) calcining the compact body to obtain a silicon carbide porous ceramic body; (4) treating natural crystalline flake graphite, and drying and puffing to obtain sulfur-free expanded graphite; (5) adding Si powder and PVA into the sulfur-free expanded graphite to form sulfur-free expanded graphite colloid; (6) soaking the silicon carbide porous ceramic body in the sulfur-free expanded graphite colloid to form a porous graphite body filled with expanded graphite and silicon; and (7) drying the formed porous graphite body filled with expanded graphite and silicon, and performing high-temperature treatment to obtain the silicon carbide crystal growth raw material. The problem that crystals are polymorphic and carbon inclusions are generated due to non-uniform proportion of Si and C in a silicon carbide crystal raw material is solved.

Description

technical field [0001] The invention belongs to the field of silicon carbide crystal preparation, and more specifically relates to a method for preparing silicon carbide crystal growth raw materials by a PVT method. Background technique [0002] At present, during the PVT silicon carbide crystal growth process, the silicon in the heated raw material at the edge of the crucible is sublimated and easily graphitized, and the silicon element enters the growth chamber and forms Si at the edge of the growth chamber. 2 C and SiC 2 The intermediates are further sublimated to the surface of the seed crystal to complete the crystal growth, but because the edge is hotter than the middle, the Si sublimation at the edge is more severe than that in the middle. As the crystal growth progresses, the ratio of Si and C elements in the later stage is not uniform. , it will lead to crystal polymorphism, defects such as carbon inclusions, which seriously affect the quality of crystal growth in ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/36C30B28/12C30B23/00
CPCC30B29/36C30B28/12C30B23/00
Inventor 不公告发明人
Owner 哈尔滨科友半导体产业装备与技术研究院有限公司
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