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Lower electrode shielding device of plasma etching machine

A plasma and shielding device technology, applied in the field of radiation protection, can solve problems such as radiation, and achieve the effects of high degree of fit and simple installation and removal methods

Pending Publication Date: 2021-11-19
深圳市应见科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the lower electrode of the plasma etching machine has radiation to the human body, and provide a shielding device for the lower electrode of the plasma etching machine, which has the effect of isolating radiation

Method used

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  • Lower electrode shielding device of plasma etching machine
  • Lower electrode shielding device of plasma etching machine
  • Lower electrode shielding device of plasma etching machine

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Embodiment 1

[0042] The embodiment of the present invention provides a shielding device for the lower electrode of a plasma etching machine, which includes an isolation combination block 1, a base 2 and a top cover 9, wherein the base 2 is connected by a fixing iron sheet 6 and a screw 7 At the bottom of the isolation combination block 1 , the top cover plate 9 covers the top open end of the isolation combination block 1 . The materials of the isolation combination block 1, the base 2 and the top cover plate 9 are all lead metal, which has excellent radiation protection function, and the lower electrode of the plasma etching machine is arranged on the top cover plate 9 The center hole 10 of the cover plate is inserted into the shielding device, so that the shielding device protects workers from radiation threats.

[0043] Two adjacent side surfaces of the isolation combination block 1 are also provided with a combination closing door 5, and the combination closing door 5 closes the isolati...

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PUM

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Abstract

The invention relates to the field of radiation protection, and discloses a lower electrode shielding device of a plasma etching machine. The shielding device comprises an isolation combination block, a base and a top cover plate allmade of a radiation protection material; the base is fixed to the bottom of the isolation combination block, the top cover plate covers the top opening end of the isolation combination block and is connected with the base and the top cover plate through a telescopic rod, the top cover plate ascends and descends along with telescopic movement of the telescopic rod, so as to open or close the opening end of the isolation combination block, the isolation combination block is provided with an upper cover groove, and the top cover plate is provided with a movable inserting piece connected with the upper cover groove in a matched mode. The shielding device is good in radiation isolation effect and simple in mounting and dismounting mode.

Description

technical field [0001] The invention relates to the technical field of radiation protection, in particular to a lower electrode shielding device of a plasma etching machine. Background technique [0002] Etching is a very important step in semiconductor processing, microelectronics manufacturing, LED production and other fields. Common etching methods mainly include dry etching and wet etching. Compared with wet etching, dry etching has the advantages of good anisotropy, high selectivity, controllable process, good repeatability, and no chemical waste pollution. Dry etching can be divided into photovolatility etching, vapor phase etching, plasma etching, etc. Plasma etching is a common form of dry etching at present. When the gas is exposed to the electron region, ionized gas and gas with high-energy electrons are generated to form plasma. The ionized gas will release a large amount of energy after passing through the accelerated electric field. etched surface. Compared ...

Claims

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Application Information

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IPC IPC(8): H01J37/32H01L21/67
CPCH01L21/67069H01J37/32651H01J37/32532
Inventor 林畅聪
Owner 深圳市应见科技有限公司