Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Metastructure device and design and preparation method thereof

A metasurface and device technology, applied in the field of electromagnetic wave phase and amplitude regulation, can solve the problems of limited, narrow bandwidth, and difficulty in realizing circular dichroism, and achieve the effect of high polarization conversion efficiency and large working bandwidth

Pending Publication Date: 2022-01-18
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF16 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the limitation of conjugate symmetry and coupling in the structure, the generalized geometric phase metasurface has problems such as narrow bandwidth, low efficiency and difficulty in realizing circular dichroism.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metastructure device and design and preparation method thereof
  • Metastructure device and design and preparation method thereof
  • Metastructure device and design and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 2

[0084] like Figure 5 Shown is a schematic diagram of the basic element structure of the second embodiment of the metasurface device compatible with generalized geometric phase control and circular dichroism; in the broadband range of 1200-1300nm, the central wavelength λ 0 When the thickness of the metal structure layer 5 is 1250 nm, the thickness H=240 nm. Except for the spiral structure in the first embodiment, other parameters (including the material and the thickness of each film layer) are the same as the first embodiment. Among them, the initial arc expression represented by the dotted line on the right is:

[0085] x=r*sin(ξ)

[0086] y=r*cos(ξ) (2)

[0087] Where r=200nm is the radius of the arc, ξ is the angle variable, the value range is 0-0.7π, x and y are the horizontal and vertical coordinate values ​​of different positions of the arc. The arc is rotated by α=2π / 9 and connected end to end to form a single arc structure. A single arc structure is rotated by β=...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a metasurface device and a design and preparation method thereof, and the metasurface device comprises a metal reflection layer, a dielectric layer and a metal structure layer with n-fold rotational symmetry, which are stacked from bottom to top; a plurality of unit structures are arranged on the metal structure layer, each unit structure comprises n arc-shaped structures, vertexes of the n arc-shaped structures are in contact, the rotation angle beta between every two adjacent arc-shaped structures is equal to 2pi / n (rad), n is an odd number, a generalized geometric phase regulation equation phi = + / -2n theta (theta is a direction angle of the sub-wavelength structure) is met, meanwhile, the broadband circular dichroism is achieved, and the metal structure layer has different absorptivity for left-handed and right-handed circularly polarized incident light. The metasurface device can be used in systems of chiral spectrometers, chiral imaging and the like.

Description

technical field [0001] The invention belongs to the technical field of electromagnetic wave phase and amplitude regulation, in particular to a metasurface device and its design and preparation methods. Background technique [0002] Traditional optical systems achieve wavefront control by combining multiple curved optical elements with different surface shapes and materials. The combination of these complex devices makes the entire optical system bulky and complicated, and it is difficult to meet the development trend of modern optical planarization, integration and multi-function. In recent years, as a functional film layer device that can artificially design and arrange subwavelength structures, metasurfaces, also known as two-dimensional metamaterials, can flexibly control the phase, polarization, amplitude and frequency of light waves at the subwavelength scale. The planarization and miniaturization of optical systems provide new avenues. [0003] In 1956, Pancharatnam ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/30G02B27/00
CPCG02B5/30G02B27/0012Y02D30/70
Inventor 罗先刚张飞蒲明博蔡吉祥马晓亮李雄
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com