PDMS photoetching micro-nano bubble preparation method and micro-nano bubble test method

A technology of micro-nano bubbles and photolithography, which is applied in the preparation of test samples, the mixing of gas/vapor and liquid, and the analysis of materials through optical means, can solve the problems of lack of production methods for large-scale production of micro-nano bubbles, and achieve The effects of test comprehensiveness, comprehensive functions and high production efficiency

Active Publication Date: 2022-01-21
CHONGQING UNIV +1
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Problems solved by technology

[0003] The present invention aims to provide a low-cost, high-production-efficiency PDMS photoetching micro-nano-bubb

Method used

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  • PDMS photoetching micro-nano bubble preparation method and micro-nano bubble test method
  • PDMS photoetching micro-nano bubble preparation method and micro-nano bubble test method
  • PDMS photoetching micro-nano bubble preparation method and micro-nano bubble test method

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preparation example Construction

[0028] to combine figure 1 — figure 2 As shown, the preparation method of PDMS photolithography micro-nano bubbles comprises the following steps:

[0029] Step A, set up a nano-bubble generating device; the device consists of a micro-flow pump equipped with a liquid injector and controlling the flow rate of the liquid, a micro-flow pump equipped with a gas injector and controlling the flow rate of the gas, and a quick photo and screenshot software installed for real-time observation The computer for the flow of liquid and gas in the channel and the movement of the bubbles, and the microscope for magnifying the channel to facilitate seeing clear bubbles on the display are connected to each other.

[0030] Step B, micro-channel design and template production; design nine types of micro-channels with different channel widths and different angles between the two entrances of the channel, make a mask according to the channel diagram, and clean the mask with alcohol After drying,...

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Abstract

The invention discloses a PDMS photoetching micro-nano bubble preparation method. The preparation method comprises the following steps: step A, erecting a nano bubble generating device; step B, designing a micro-channel and manufacturing a template; designing nine micro-channels with different channel widths and different included angles at two inlets of the channels; step C, manufacturing a PDMS template; pouring the mixed solution into a silicon wafer template, and putting the prepared PDMS template into a drying box overnight; step D, preparing micro-nano bubbles; pressing down the start button, and enabling gas and liquid to enter the channel at the same time. The invention also discloses a PDMS photoetching micro-nano bubble test method. The method comprises the following steps: step A, debugging bubbles meeting the standard; step B, measuring the size of the micro-nano bubbles; step C, measuring the rising speed of the micro-nano bubbles in the water; step D, verifying the sewage treatment effect of the micro-nano bubbles. The PDMS photoetching micro-nano bubble preparation method and the micro-nano bubble test method have great application prospects.

Description

technical field [0001] The invention relates to sewage treatment technology, in particular to a method for preparing PDMS photolithographic micro-nano bubbles and a method for testing micro-nano bubbles. Background technique [0002] The size of the micro-nano bubble is small, so it stays in the water for a long time, and has more opportunities to contact the suspended matter. In addition, its specific surface area is relatively large, so the probability of adhesion will be greatly increased, and the air flotation effect will be greatly improved. Well, micro-nano bubbles are characterized by strong adhesion and slow rise in water, which are beneficial to sewage treatment, but the prior art lacks a large-scale, low-cost production method for micro-nano bubbles, and lacks corresponding micro-nano bubble tests. Contents of the invention [0003] The present invention aims to provide a low-cost and high-production-efficiency method for preparing PDMS photolithographic micro-na...

Claims

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Application Information

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IPC IPC(8): G01N21/84G01N1/28B01F23/20
CPCG01N21/84G01N1/28Y02P70/50
Inventor 刘安平姚凯彬陈照贤黄映洲张欣
Owner CHONGQING UNIV
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