Flexible near-infrared wave trapping plate and manufacturing process thereof, and method and system applied to cultural relic detection
A production process, near-infrared technology, applied in the direction of photographic filters, phase influence characteristics measurement, optical filters, etc., can solve the problems of difficult repair or recovery, low price, difficult to install flexibly, etc., to achieve processing Reliable and stable process, good cultural relics monitoring, and the effect of reducing the requirements for measuring equipment
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Embodiment 1
[0055] like figure 1 As shown, a flexible near-infrared notch plate applied to the special spectrum identification of cultural relics provided by this embodiment includes a substrate and a composite film arranged on the substrate, the composite film includes several layers of films, and the composite film is a refractive Materials with different indices are formed according to the structure of alternating multilayer films; the refractive indices of the adjacent films are different; the thickness of the films in each layer in this embodiment is between 10nm and 500nm; it has been proved by experiments that within this thickness range, each The layers are stacked together to quickly get the notch effect.
[0056] The substrate provided in this embodiment is made of a material that is transparent to visible light;
[0057]Several layers of films provided in this embodiment are made of materials transparent to visible light;
[0058] The composite film includes a first refractiv...
Embodiment 2
[0065] The high refractive index material of this embodiment selects TiO 2 Material, low refractive index material selection SiO 2 material, making up HL s The basic periodic film system, where H is a high refractive index material and L is a low refractive index material, adopts the needle method that comes with the film system software TFCalc, that is, by continuously inserting thin layers to increase the dimension of variables to form a continuous The optimization process is used to design the film system. After the design is completed, it can be plated by magnetron sputtering in the PVD 75 produced by Kurt J. Lesker Company according to the designed film system. Since the flexible substrate is not resistant to high temperature, this can solve the problem of high working temperature in the thermal evaporation coating method and It can precisely control the plating of extremely thin film layers.
[0066] According to the materials determined above, the overall design and ...
Embodiment 3
[0081] The flexible near-infrared notch plate provided in this embodiment is, for example, transparent in the visible light band, with a central peak of near-infrared at 960 nm and a full width at half maximum of 100 nm.
[0082] 1) Determine TiO 2 Design parameters and processing parameters. Process 50nm TiO according to the processing flow 2 Single-layer sample, the actual thickness measured by ellipsometer is 51.79nm, considering the error is within the allowable range, the tooling value is not adjusted to 106, TiO 2 The actual refractive index is as image 3 shown. image 3 TiO 2 Actual refractive index curve.
[0083] 2) Determine SiO2 2 Design parameters and processing parameters. Process 50nm SiO according to the processing flow 2 Single-layer sample, the actual thickness measured by ellipsometer is 138.58nm, the tooling value is corrected to 294, SiO 2 The actual refractive index is as Figure 4 as shown, Figure 4 for SiO 2 Actual refractive index curve. ...
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Abstract
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