Method for improving triboelectricity output performance by inductively coupled plasma dry etching
A dry etching, inductive coupling technology, used in triboelectric generators, nanotechnology for materials and surface science, nanostructure manufacturing, etc. Sex-enhancing effects
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Embodiment 1
[0055] The method for improving the triboelectric output performance of a polyvinyl chloride (PVC) film based on an inductively coupled plasma dry etching technology includes the following steps:
[0056] Step S1: cleaning of the PVC film: take a PVC film cut into 4*4cm and place it in anhydrous ethanol for ultrasonic cleaning for 10 minutes, then ultrasonically clean it with deionized water for 10 minutes, and then dry to obtain a clean PVC film;
[0057] Step S2: placing the cleaned PVC film in the carrier for plasma etching, and sending it into the cavity of the plasma dry etching equipment;
[0058]Step S3: the equipment is evacuated to keep the pressure stable, and the etching process is divided into two stages. The first stage: pass 15sccm O2, 45sccm CHF 3 , the ICP power is 100W, the RF power is 10W, and the etching time is 10min; the second stage: pass 50sccm C4F8, the ICP power is set to 100W, the RF power is 10W, and the etching time is 10s;
[0059] Step S4: after...
Embodiment 2
[0062] The steps of Example 2 are the same as those of Example 1, except that:
[0063] In step S3, the RF power is 20W;
[0064] In step S5, the etched PVC film ICP-2 is taken out;
Embodiment 3
[0066] The steps of Example 2 are the same as those of Example 1, except that:
[0067] In step S3, the RF power is 25W;
[0068] In step S5, the etched PVC film ICP-3 is taken out;
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