Device for capturing reaction by-products generated in organic film deposition engineering

Abstract

The present invention relates to an apparatus for capturing a reaction by-product generated in an organic film deposition process, and the apparatus for capturing a reaction by-product generated in an organic film deposition process according to the present invention comprises: a housing for accommodating and discharging an unreacted gas flowing therein; a heater which is located inside the housing and uniformly heats the gas while diffusing the gas that has flowed in by diffusers arranged in a double-structure radial pattern; and an internal capture tower in which first to fifth disk-type capture units are vertically arranged, the first to fifth disk-type capture units comprising structural capture plates which are radially arranged and have a wide surface area per unit area, and capture disks in which exhaust holes are formed in the center or radially arranged in order to concentrate or disperse the gas flow.

Description

technical field [0001] The present invention relates to a device for capturing reaction by-products generated in an organic film deposition process, and in particular to a device for capturing unreacted gas contained in an unreacted gas discharged after an organic film deposition process is performed in a process chamber in a semiconductor manufacturing process. The particulate reaction by-products are captured in the form of a thin film and equipped with an internal capture tower with a wide surface area and a flow rate reduction structure, so that the capture device can be captured with high efficiency by increasing the residence time under the conditions of uniform flow rate and capture temperature. Background technique [0002] Generally speaking, semiconductor manufacturing engineering generally includes pre-engineering (Fabrication) and post-engineering (Assembly), and the pre-engineering refers to the repeated execution in the inside of various process chambers (Chambe...

AI Technical Summary

Problems solved by technology

[0007] However, the structure of the internal capture tower used in the existing by-product capture device is formed by processing a plurality of holes with the same or different sizes on the surface of the capture plate and adding radiator fins around the periphery. Differences in flow velocity between fast and slow flows and warm currents of varying magnitudes at multiple locations are created by varying load sizes in the gas stream, resulting in stagnation of the gas and increased separation between the capture surface and unreacted gas way of the contact area, and thus has a structural defect in providing a uniform and stable gas flow while reducing the flow rate of the unreacted gas

[0008] Because of the above-mentioned reasons, under the existing structure of the trapping device, unreacted gas containing fine reaction by-products is exhausted and flows into the trapping device after the organic film deposition (Organic Film Deposition) process is performed in the process chamber. Because there is no stable flow rate reduction structure and a capture plate with high capture efficiency per unit area, the capture conditions cannot be fully met, and the reaction by-products cannot be captured in the form of a thin film.

Images