Reticle, lithographic apparatus and method for manufacturing reticle
A mask plate and control electrode technology, applied in the field of photolithography, can solve the problems of cumbersome process, increased chip cost, high cost of mask plate, etc.
Pending Publication Date: 2022-08-05
WESTLAKE UNIV
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Problems solved by technology
However, once the reticle is made, the pattern within it cannot be easily altered
Also, if there are defects in the reticle or if defects are introduced during the use of the reticle, it is difficult to repair these defects
Additionally, reticles typically have a high cost
All of the above factors will lead to an increase in the cost of chips produced using reticles, and the cumbersome process of reticle defect monitoring.
Method used
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[0045] The present disclosure will be described below with reference to the accompanying drawings, which illustrate several embodiments of the disclosure. It should be understood, however, that this disclosure may be presented in many different forms and is not limited to the embodiments described below; Those skilled in the art will fully explain the protection scope of the present disclosure. It should also be understood that the embodiments disclosed herein can be combined in various ways to provide still further embodiments.
[0046] It should be understood that the same reference numerals refer to the same elements throughout the drawings. In the drawings, the dimensions of certain features may be changed for clarity.
[0047] It should be understood that the phraseology in the specification is used to describe particular embodiments only and is not intended to limit the present disclosure. All terms (including technical and scientific terms) used in the specification ...
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Abstract
The invention relates to a mask plate, a photoetching device and a method for manufacturing the mask plate, and the mask plate comprises an electrolytic reaction layer, metal elements in the electrolytic reaction layer are configured to be in a metal deposition state or a dissolved ion state; the first control circuit layer is arranged on the first side of the electrolytic reaction layer, and the first control circuit layer comprises a plurality of first control electrodes; the second control circuit layer is arranged on the second side, opposite to the first side, of the electrolytic reaction layer, and the second control circuit layer comprises a plurality of second control electrodes; wherein the light transmission state of a pixel region in the mask is configured to be determined by a control voltage between at least a part of a first control electrode and at least a part of a second control electrode included in the pixel region, and the control voltage controls the light transmission state of the pixel region by controlling the deposition amount of metal in the electrolytic reaction layer.
Description
technical field [0001] The present disclosure generally relates to the field of lithography, and more particularly, to a reticle, a lithography apparatus, and a method for fabricating a reticle. Background technique [0002] In photolithography, a reticle is typically used to form patterned structures. However, once the reticle is made, the pattern in it cannot be easily changed. Furthermore, if there are defects in the reticle or defects are introduced during the use of the reticle, it is difficult to repair these defects. In addition, reticles typically have a high cost. All of the above factors will lead to an increase in the cost of chips produced using a reticle, and a cumbersome process brought about by reticle defect monitoring. Therefore, there is a need for new reticles in chip production technology. SUMMARY OF THE INVENTION [0003] An object of the present disclosure is to provide a reticle, a lithography apparatus, and a method for manufacturing a reticle. ...
Claims
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Login to View More IPC IPC(8): G03F1/00G03F1/68G02F1/01G02F1/15G02F1/163
CPCG03F1/00G03F1/68G02F1/0102G02F1/0121G02F1/15G02F1/163
Inventor 李西军
Owner WESTLAKE UNIV