Production method for copper-clad laminated sheet
A technology of copper-clad laminates and manufacturing methods, which is applied in the direction of multilayer circuit manufacturing, lamination, and lamination devices, and can solve the problems of reducing the utilization rate of raw materials for products and poor etching accuracy, etc.
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Embodiment 1
[0039] Here, the copper foil according to the first aspect of the present invention, that is, a VLP copper foil with a thickness of 18 μm classified as a very low profile type foil according to the IPC standard was used. The characteristic held by this VLP copper foil is that the tensile strength is 52 kg / mm 2 , The Vickers hardness is 150, the elongation after heating is 3.8%, and the breaking strength measured by the compression test after heating is 552 kN / m 2 .
[0040] The resin layer 3 with a thickness of 50 micrometers is formed on the rough-worked surface of the VLP copper foil with fine copper particles 2 attached, thereby producing the resin-attached copper foil 4 . When forming the resin layer 3, the resin composition that is dissolved in the formed solid content in methyl ethyl ketone with following chemical reagent is 45% resin composition: Resin is the bisphenol A type epoxy resin (trade name: EPOMIC R-301, manufactured by Mitsui Petrochemical Co., Ltd.), 20% b...
Embodiment 2
[0044] Here, use the copper foil described in the second aspect of the present invention, that is, the copper foil 10 with an erodible carrier foil, which forms a 3μ thick copper foil circuit on the side of the 25 micron thick aluminum carrier foil 8. The copper foil layer 9. The following parts are the same as those of the first embodiment, and the description thereof is omitted to avoid repetition. In addition, the same parts are denoted by the same symbols as those in the first embodiment as much as possible.
[0045] A resin layer 3 with a thickness of 100 microns is formed on the surface of the rough-worked copper foil layer 9 with fine copper particles 2 adhered to the copper foil 10, thereby making the attached foil with the resin layer copper foil11. At this time, since the resin used for forming the resin layer 3 is the same as that of the first embodiment, description thereof will be omitted.
[0046] Then, using this copper foil 11 with a resin layer, to Figure...
Embodiment 3
[0048] Here, the copper foil described in the third aspect of the present invention is used, that is, the copper foil 10 with a peelable carrier foil, which forms a 5μ thick copper foil circuit on the side of the 18 μm thick copper carrier foil 8. Copper foil layer 9, and carboxybenzotriazole is used to form joint interface layer 12 between carrier foil layer 8 and copper foil layer 9. The following parts are the same as those in the case of the first embodiment, and the description thereof is omitted to avoid repetition. In addition, the same parts are denoted by the same symbols as those in the first embodiment as much as possible.
[0049] A resin layer 3 with a thickness of 100 microns is formed on the surface of the rough-worked copper foil layer 9 with fine copper particles 2 adhered to the copper foil 10, thereby making the attached foil with the resin layer copper foil11. At this time, since the resin used for forming the resin layer 3 is the same as that of the firs...
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Abstract
Description
Claims
Application Information
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