Thin film for vacuum sucking wafer, wafer sucking device and vacuum sucking grinder
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- UNITED MICROELECTRONICS CORP
- Publication Date
- 2005-12-28
- Estimated Expiration
- Not applicable Β· inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a semiconductor transmission device, and in particular to a membrane (Membrane) for vacuum adsorption wafers. Background technique
[0002] The mechanism used in the current wafer transfer system includes various methods, among which the method of using vacuum to absorb and hold wafers has been widely used. Taking the evolution of Chemical Mechanical Polishing devices as an example, please refer to figure 1 and figure 2 , and match the description below.
[0003] figure 1 Shown is a partial schematic diagram of a known chemical mechanical polishing device.
[0004] Please refer to figure 1 , the known chemical mechanical polishing device includes a polishing head (Polishing Head) 100 and a polishing platform (Polishing Table) 110, and a layer of polishing pad (Polishing Pad) 120 is covered on the polishing platform 110. Wherein, the grinding head 100 includes a chuck 102 for fixing the wafer 108, and there is also a laye...