Coated glass with ultraviolet ray cutting-off function and preparation method thereof
A coating glass and ultraviolet technology, applied in the coating and other directions, can solve the problems of complex process and difficult control of cerium ion addition, and achieve the effect of simple and flexible process, avoid material aging, and complete crystallization
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example 1
[0014] A preparation method for ultraviolet cut-off coated glass, comprising the steps of:
[0015] 1). Firstly, after cleaning and drying the glass substrate to be coated, carry out pre-vacuum transition;
[0016] 2). Then use the magnetron sputtering plating method to coat the film layer: a). Prepare the target material, the target material is composed of titanium oxide and cerium oxide, and the mass ratio of cerium oxide and titanium oxide in the target material is 1 / 3;
[0017] b). Carry out magnetron sputtering coating on the glass substrate in a pure argon atmosphere to obtain ultraviolet cut-off coated glass, the sputtering pressure is 0.4Pa, and the thickness of the titanium oxide-cerium oxide coating layer is 210nm. The film thickness is controlled by the film thickness controller in the coating equipment.
[0018] c). Use off-line heating for the obtained UV cut-off coated glass—meaning that the glass is not heated during the coating process, the heating temperature...
example 2
[0021] A preparation method for ultraviolet cut-off coated glass, comprising the steps of:
[0022] 1). Firstly, after cleaning and drying the glass substrate to be coated, carry out pre-vacuum transition;
[0023] 2). Then use the magnetron sputtering plating method to coat the film layer: a). Prepare the target material, the target material is composed of titanium oxide and cerium oxide, and the mass ratio of cerium oxide and titanium oxide in the target material is 1 / 3;
[0024] b). Carry out magnetron sputtering coating to the glass substrate in the mixed gas of argon and oxygen to obtain ultraviolet cut-off coated glass, the sputtering pressure is 0.4Pa, and the mass ratio in the argon-oxygen mixed gas is oxygen: argon during sputtering =1:20; the thickness of the titanium oxide-cerium oxide film layer is 210nm.
[0025] c). The obtained ultraviolet cut-off coated glass is heated off-line, the heating temperature is 800° C., and the heating time is 10 minutes.
[0026] ...
example 3
[0028] A preparation method for ultraviolet cut-off coated glass, comprising the steps of:
[0029] 1). Firstly, after cleaning and drying the glass substrate to be coated, carry out pre-vacuum transition;
[0030] 2). Then use the magnetron sputtering plating method to coat the film layer: a). Prepare the target material, the target material is composed of titanium oxide and cerium oxide, and the mass ratio of cerium oxide and titanium oxide in the target material is 3 / 2;
[0031] b). Carry out magnetron sputtering coating to the glass substrate in oxygen-argon mixed gas to obtain ultraviolet cut-off coated glass. 20; The thickness of the titanium oxide-cerium oxide film layer is 210nm.
[0032] c). The obtained ultraviolet cut-off coated glass was heated off-line, the heating temperature was 20° C., and the heating time was 120 minutes.
[0033] In the titanium oxide-cerium oxide film layer of the obtained ultraviolet cut-off coated glass, the mass ratio of cerium oxide an...
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