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Photosensitive composition

A composition and sensitivity technology, applied in the directions of chromate compound components, photosensitive materials used in opto-mechanical equipment, etc., can solve the problems that the productivity of printing press flatbed or photo-etched products cannot be improved, the irradiation intensity of high-energy rays is high, and the exposure Long time and other problems, to achieve the effect of shortened exposure time, high sensitivity and high resolution

Inactive Publication Date: 2006-10-25
THE INCTEC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, there is a problem with these dichromate-containing photosensitive compositions in that since they are less sensitive to exposure to high-energy rays such as ultraviolet light sources, they require a longer exposure time, a high intensity of high-energy rays, and a large dose , so that the productivity of press flatbed or photoetched products cannot be increased

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-7

[0048] Embodiment 1-7 (photosensitive composition K1-K7)

[0049] H 2 SO 4 Casein (10 parts) was suspended in water (88 parts). Borax (1 part) was added therein, and it was heated at 80° C. with airtight stirring for 15 minutes to prepare a uniform casein aqueous solution. Ammonium dichromate (1 part) was added to the resulting aqueous solution, and the resulting mixture was sufficiently stirred to become an aqueous solution. Further, polyol a1 (1 part) of Example 1 shown in Table 1 was added thereto. Stir well to make it evenly mixed to obtain the photosensitive composition K1 of the present invention (Example 1). To aqueous solutions prepared in a similar manner, the polyols and / or ethers of Examples 2 to 7 shown in Table 1 were added, respectively, to prepare photosensitive compositions K2 to K7 (Examples 2 to 7) of the present invention.

Embodiment 8-14

[0050] Embodiment 8-14 (photosensitive composition K8-K14)

[0051]Ammonium caseinate (11 parts) was added to water (88 parts). The resulting mixture was heated at 80° C. with closed stirring for 15 minutes to prepare a uniform casein aqueous solution. Ammonium dichromate (1 part) was added to the resulting aqueous solution, and the resulting mixture was sufficiently stirred to become an aqueous solution. Further, polyol a1 (1 part) of Example 8 shown in Table 2 was added thereto. Stir well to make it evenly mixed to obtain the photosensitive composition K8 of the present invention (Example 1). To aqueous solutions prepared in a similar manner, the polyols and / or ethers of Examples 9 to 14 shown in Table 2 were added, respectively, to prepare photosensitive compositions K9 to K14 of the present invention (Examples 9 to 14).

Embodiment 15-20

[0052] Embodiment 15-20 (photosensitive composition P1-P6)

[0053] Polyethylene glycol (saponification degree: 88.0 mol%, average polymerization degree: 500; 10 parts) was dissolved in water (90 parts). Ammonium dichromate (1 part) was added to the resulting aqueous solution, and the resulting mixture was sufficiently stirred to become an aqueous solution. Further, polyol a4 (2 parts) of Example 15 shown in Table 3 was added thereto. Stir well to make it evenly mixed, and prepare the photosensitive composition P1 of the present invention (Example 15). To aqueous solutions prepared in a similar manner, the polyols of Examples 16 to 20 shown in Table 3 were respectively added to prepare photosensitive compositions P2 to P6 of the present invention (Examples 16 to 20).

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Abstract

The present invention relates to a photosensitive composition, which contains (A) at least one photosensitizer selected from dichromate and chromate, (B) water-soluble macromolecular substances, such as casein, polyvinyl alcohol, gelatin or isinglass, (C) at least one sensitivity accelerator selected from polyols and ethers; and (D) water.

Description

Background of the invention [0001] a) Field of invention [0002] The present invention relates to a photosensitive composition of dichromate / water-soluble polymer substance, more specifically, each photosensitive composition has high sensitivity and can significantly increase the yield in the process of producing products using the photosensitive composition . [0003] b) Relevant technical description [0004] Since dichromate-containing photosensitive compositions are soluble in water, easy to handle and relatively inexpensive, they have hitherto been widely used as corrosion-resistant materials in mechanical flat-plate making, such as letterpress printing plates, deep-etched offset printing plates, and screens Printing flat plates, and photoetching operations for color cathode ray tube photomasks, lead frames, and etched metal products. [0005] However, there is a problem with these dichromate-containing photosensitive compositions in that since they are less sensitive...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03C1/66G03F7/04
CPCG03C1/66G03F7/04
Inventor 小松利夫佐竹一义新田健彦
Owner THE INCTEC INC