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Plasma treatment for producing electron emitter

A technology of electron emitter and plasma, which is applied in the field of plasma processing, can solve problems such as display difficulties, and achieve the effect of improving field emission

Inactive Publication Date: 2001-03-21
EI DU PONT DE NEMOURS & CO +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But it is difficult to reliably produce such displays that are larger than suitable for a laptop computer and that can operate over a wide temperature range

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Carbon field emission electron emitters were prepared using the following method. A paste consisting of graphite particles and glass frit is screen-printed on a substrate and fired to form a composite layer comprising graphite particles and glass. This substrate consists of a layer of silver conductor composition on a glass plate.

[0047] A 22 mm x 22 mm layer of silver conductor composition (DuPont #7095 silver conductor composition, a screen printable The substrate was prepared from a thick film composition available from E.I. du Pont de Nemours and Company, Wiimington, DE), followed by firing at 525°C for 10 minutes to produce a conductive silver composite layer.

[0048] A paste consisting of graphite particles and glass frit was prepared by mixing 25% natural HPN-10 graphite powder, 25% glass, 37% vehicle, 10% beta terpineol, and 3% soy lecithin. The composition of the glass used is: 1.6% SiO 2 , 1.7% Al 2 o 3 , 85.8% PbO, 10.9% B 2 o 3 , the vehicle used c...

Embodiment 2

[0055] Use the method described in embodiment 1 to prepare carbonaceous field emission electron emitter basically, just the ion dose of incident is 10 19 ion / cm 2 .

[0056] When taken out of the vacuum chamber, the surface of the sample was examined using a scanning electron microscope, and the observed appearance consisted of a large number of larger pyramidal structures with a large base diameter and a very thin tip. The diameter of the base is about 3 microns, and the height of the structures is about 5 microns.

[0057] Electron emission from an ion-bombarded 1 cm x 1 cm area was obtained by placing a glass plate containing screen-printed and ion-bombarded graphite particles on the copper block of the measurement cell described above. Two pieces of conductive tape were applied to each side of the substrate to hold the substrate in place and provide electrical contact to the silver composite layer. The surface of the screen printed sample and the copper block anode were...

Embodiment 3

[0059] Two carbonaceous field emission electron emitters were prepared using essentially the method described in Example 1, with the following differences: .

[0060] (a) by screen printing a 22 mm x 22 mm layer of silver conductor composition (DuPont #7095 silver conductor composition, a A thick film composition, available from E.I. du Pont de Nemours and Company, Wiimington, DE), was screen printable to prepare a substrate for one emitter. A 7.75 inch by 7.75 inch (19.7 cm by 19.7 cm) layer of the same silver conductor composition was screen printed on an 8 inch by 8 inch (20.3 cm by 20.3 cm) glass plate for the second emission. Body substrate;

[0061] (b) For smaller samples, the paste was applied to the silver composite layer on the glass plate in a 14 mm x 14 mm square pattern as described in Example 1. For larger samples, the paste was applied to the silver composite layer on the glass plate in a square pattern 6.75 inches by 6.75 inches (17.1 cm by 17.1 cm);

[0062...

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Abstract

Plasma treatment for producing carbonaceous field emission electron emitters is disclosed. A plasma of ions is generated in a closed chamber and used to surround the exposed surface of a carbonaceous material. A voltage is applied to an electrode that is in contact with the carbonaceous material. This voltage has a negative potential relative to a second electrode in the chamber and serves to accelerate the ions toward the carbonaceous material and provide an ion energy sufficient to etch the exposed surface of the carbonaceous material but not sufficient to result in the implantation of the ions within the carbonaceous material. Preferably, the ions used are those of an inert gas or an inert gas with a small amount of added nitrogen.

Description

field of invention [0001] The present invention relates to plasma processing for producing field emission electron emitters. This invention is the result of execution of a Department of Energy contract (Contract No. W-7405-ENG-36). background of the invention [0002] Field emission electron sources are commonly referred to as field emission materials or field emitters, and they can be used in a variety of electronic applications, such as vacuum electronics, tablet computers, televisions, and other display screens, emission Strobe and klystron, and lighting. [0003] Displays are used in a wide variety of applications such as home and industrial televisions, laptop and desktop computers, indoor and outdoor advertising and information displays. Compared with the depth of cathode ray tube monitors used in most televisions and desktop computers, flat-panel displays are only a few inches thick. Flat panel displays are essential for laptop computers, but also offer weight and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J9/02C23F4/00H01J37/32
CPCC23F4/00H01J2237/334H01J9/025H01J2237/3137H01J2237/32H01J37/32
Inventor D·M·科茨K·C·瓦尔特
Owner EI DU PONT DE NEMOURS & CO