Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive compound and photosensitive composition

A technology of photosensitive compounds and photosensitive compositions, applied in chemical instruments and methods, photosensitive materials for optomechanical equipment, optics, etc., capable of solving problems such as unsatisfactory resolution

Inactive Publication Date: 2001-05-30
SANYO CHEM IND LTD +1
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Stilbene nitrides have a maximum absorption wavelength of 335nm or longer, and photosensitive compositions containing such nitrides show satisfactory resolution during close contact exposure, but there are also problems in that they do not show satisfactory resolution

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive compound and photosensitive composition
  • Photosensitive compound and photosensitive composition
  • Photosensitive compound and photosensitive composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0140] Synthesis of disodium 4,4'-diazido-2,2'-methylenedibenzenedisulfonate

[0141] (1) 3-aminobenzenesulfonic acid (10 grams, 57.8 mmol) is dissolved in 4.5 grams of 37% formalin (in water), 20 grams of concentrated hydrochloric acid (the content of pure substance is 35%) and 20 grams of water composition In a mixed solvent, the reaction was carried out at 80° C. for 5 hours. The reaction mixture was cooled, then sodium hydroxide was added to make it basic, the mixture was poured into 500 ml of acetone, and the resulting solid precipitate was collected by filtration to obtain 6.7 g (16.7 mmol) of crude 4,4'-diamino-2 , 2'-methylene diphenyl disulfonate disodium, yield = 58%.

[0142] (2) The crude disodium 4,4'-diamino-2,2'-methylenedibenzenedisulfonate (6.7 g, 16.7 mmol) prepared in (1) was dissolved in 100 g of water and In a mixed solvent composed of 5 g of concentrated hydrochloric acid (the content of pure substance is 35%), the solution is cooled to 0-5°C. To this ...

Embodiment 2

[0152] Synthesis of disodium 4,4'-diazido-3,3'-methylenedibenzenedisulfonate

[0153] (1) 2-aminobenzenesulfonic acid (10 grams, 57.8 mmol) is dissolved in 4.5 grams of 37% formalin (in water), 20 grams of concentrated hydrochloric acid (the content of pure substance is 35%) and 20 grams of water composition In a mixed solvent, the reaction was carried out at 80° C. for 5 hours. The reaction mixture was cooled, then sodium hydroxide was added to make it alkaline, the mixture was poured into 500 ml of acetone, and the resulting solid precipitate was collected by filtration to obtain 7.4 g (18.5 mmol) of crude 4,4'-diamino-3 , 3'-Methylene diphenyl disulfonate disodium, yield = 64%.

[0154] (2) The crude disodium 4,4'-diamino-3,3'-methylenedibenzenedisulfonate (7.4 g, 18.5 mmol) prepared in (1) was dissolved in 100 g of water and 5 In a mixed solvent composed of 1 gram of concentrated hydrochloric acid (the content of pure substance is 35%), the solution is cooled to 0-5°C. ...

Embodiment 3

[0164] Synthesis of disodium 4,4'-diazido-2,2'-(1,2-ethylidenebenzene)disulfonate

[0165] (1) 4,4'-diamino-2,2'-stilbene disulphonic acid disodium (20 g, 48.7 mmol) was dissolved in 150 ml of ethanol, and 1.0 g of 5% palladium-carbon was added thereto, Under a hydrogen atmosphere at normal pressure, the mixture was stirred at room temperature for hydrogenation. After confirming that hydrogen adsorption stopped, 5% palladium-carbon was removed by filtration, and ethanol was distilled off under reduced pressure to obtain 18.4 g (44.3 mmol) of crude 4,4'-diamino-2,2'-(1,2-ethylene phenyl) disodium sulfonate, yield = 91%.

[0166] (2) The crude disodium 4,4'-diamino-2,2'-ethylenebenzenedisulfonate (18.4 g, 44.3 mmol) prepared in (1) was dissolved in 800 g of water and 13 g In a mixed solvent composed of concentrated hydrochloric acid (content of pure substance: 35%), the solution was cooled to 0-5°C. To this solution was added an aqueous solution (12 ml) containing 3.4 g (48.7...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
absorption wavelengthaaaaaaaaaa
absorption wavelengthaaaaaaaaaa
absorption wavelengthaaaaaaaaaa
Login to View More

Abstract

A water-soluble photosensitive compound which is represented by formula (1) or (2) and in which the photosensitive group gives an ultraviolet absorption spectrum having an absorption maximum wavelength of 305 nm or shorter; In the formulae, X represents a direct bond, C1-5 alkylene, -CH2O-, -OCH2-, -CH2OCH2-, -O-, -S-, or -SO2-; and Z represents -SO3.Q<+> or -SO2NR2, wherein Q<+> represents Li<+>, Na<+>, K<+>, or N<+>R4 and R represents C1-5 alkyl and / or hydrogen.

Description

technical field [0001] The present invention relates to a photosensitive compound and a photosensitive composition, in particular, the present invention relates to a water-soluble photosensitive compound having a photosensitive group with maximum ultraviolet absorption in the short-wave ultraviolet region, and also relates to a photosensitive composition comprising the compound. Background of the invention [0002] In the prior art, photosensitive compositions are used as materials for forming required fine patterns by irradiation with ultraviolet rays or similar activating energy beams. [0003] For photosensitive compositions containing nitrides, Japanese Patent Publication Sho-48-79970 discloses a photosensitive composition comprising polyvinylpyrrolidone and nitrides, and Japanese Patent Publication Sho-50-33764 discloses a photosensitive composition comprising Acrylamide-Diacetone Acrylamide Copolymer and Nitride. [0004] Stilbene nitrides are used as nitrides in the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C07C247/16C07C309/46C07C311/38C07C317/34C07C317/48C07C323/63C07C323/66C07C323/67G03F7/008G03F7/012
CPCC07C247/16C07C323/63G03F7/008C07C317/48C07C311/38G03F7/0125C07C309/46C07C323/67C07C317/34C07C323/66G03F7/0388G03F7/033G03F7/027G03F7/405G03F7/012H01J29/327C09K19/542C07C205/34
Inventor 渡辺哲也向井孝夫丹羽恭规野田桂子渡部千代治
Owner SANYO CHEM IND LTD