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13 results about "Photosensitizing compounds" patented technology

A thick positive photoresist, a photoresist layer and a preparation method thereof

The application provides a thick positive photoresist, a photoresist layer and a preparation method thereof, and relates to the technical field of photoetching machines. The thick positive photoresist comprises, in parts by mass, 30-70 parts of phenolic resin, 20-40 parts of a silicon-containing copolymer film-forming resin, 10-20 parts of a photosensitive compound, 0.01-1 part of a leveling agent and 80-150 parts of a solvent. The structure of the silicon-containing copolymer film-forming resin comprises: wherein R is selected from H or C1-C5 alkyl. By adding the silicon-containing copolymer film-forming resin to the phenolic resin, the adhesion, flexibility, thermal stability and mechanical strength of the photoresist layer are improved by using the thermal stability, high-temperature resistance, mechanical properties and corrosion resistance of the film-forming resin, and the photoresist layer is prevented from cracking, pattern deformation and even peeling off.
Owner:FUYANG SINEVA MATERIAL TECHNOLOGY CO LTD

A photosensitive compound based on a triphenylamine derivative, its preparation method and application

This invention belongs to the field of photodynamic antibacterial materials technology, specifically relating to a photosensitive compound based on a triphenylamine derivative, its preparation method, and its application. The photosensitive compound based on the triphenylamine derivative of this invention is compound I or compound II; the structural formula of compound I is: [structural formula would be inserted here]; the structural formula of compound II is: [structural formula would be inserted here]. The photosensitive compound based on the triphenylamine derivative of this invention exhibits good antibacterial effects, achieving the killing of Staphylococcus aureus and Listeria monocytogenes at significantly lower concentrations (below 0.5 μM; even below 0.25 μM) under white light irradiation.
Owner:INST OF GEOGRAPHY HENAN ACAD OF SCI +1

Bacteria-targeting photosensitive compound and application thereof in photodynamic therapy

PendingCN121471241AAntibacterial agentsOrganic chemistryPhotosensTissue toxicity
The photosensitive compound comprises a beta-lactam ring as shown in a formula I and a Ce6 photosensitizer, and does not contain a quenching group. When the compound is in contact with MRSA and other gram positive bacteria, the beta-lactam ring structure in the compound is combined with MRSA and other gram positive bacteria cell wall synthesis key enzyme-transpeptidase to provide targeting for the photosensitizer Ce6, so that the targeting effect on the bacteria is realized, the specificity is strong, a large amount of active oxygen is generated under illumination to kill the bacteria, and the compound can be used as a photosensitizer Ce6. Meanwhile, damage to normal tissues is avoided, photodynamic therapy on bacterial infection is facilitated, and the photodynamic therapy has high efficiency and low tissue toxicity.
Owner:SHANGHAI NINTH PEOPLES HOSPITAL SHANGHAI JIAO TONG UNIV SCHOOL OF MEDICINE

A polyimide material and its preparation method

PendingCN122302281ADiphenyl etherImide
This invention relates to a polyimide material and its preparation method, belonging to the field of polymer materials technology. The invention uses a macromolecular diamine monomer containing PEG segments and 4,4'-diaminodiphenyl ether as a compounded diamine monomer, reacting it with a dianhydride monomer compounded with 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride and 3,3',4,4'-biphenyl tetracarboxylic dianhydride to prepare a polyimide with carboxyl groups in its side chains. Then, the polyimide with carboxyl groups in its side chains is grafted with a photosensitive compound to prepare a photosensitive polyimide material. The PEG-based macromolecular diamine provides excellent solubility, film-forming properties, and low-temperature flexibility; the rigid aromatic diamine improves mechanical strength, thermal stability, and pattern fidelity; the ether-bonded ODPA ensures solubility and uniform crosslinking; and the biphenyl-type BPDA increases modulus, reduces water absorption, and improves resolution.
Owner:SUZHOU WAZILI ELECTRONIC NEW MATERIALS CO LTD

Crosslinkable photoresist for extreme ultraviolet lithography

A method for forming a semiconductor device includes forming a photoresist layer over a substrate, exposing the photoresist layer to radiation to form a pattern therein, and selectively removing portions of the photoresist layer that are not exposed to the radiation to form a patterned photoresist layer. The photoresist layer comprises a fluorine-containing polymer, a crosslinker and a photoactive compound.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

Photocrosslinkable perfluorinated ion membranes and methods for making the same

The present application relates to a photo-crosslinkable perfluorinated ion membrane and a method for preparing the same, wherein the photo-crosslinkable perfluorinated ion membrane is obtained by mixing a perfluorinated ion exchange resin containing sulfonic acid groups or phosphoric acid groups as a film-forming resin with a quaternized photosensitive compound.
Owner:SHANGHAI JIAOTONG UNIV

Semiconductor package and method of manufacturing the same

A semiconductor package comprises a base chip, a plurality of semiconductor chips sequentially stacked on the base chip, bump structures between the base chip and a lowermost semiconductor chip of the plurality of semiconductor chips, and between the plurality of semiconductor chips, adhesive layers surrounding the bump structures between the base chip and the lowermost semiconductor chip of the plurality of semiconductor chips and between the plurality of semiconductor chips. The adhesive layers have a width equal to or less than a width of each of the plurality of semiconductor chips in a direction parallel to an upper surface of the base chip. At least one of the adhesive layers comprises a polymer resin having a hydrophilic group, a photosensitive compound physically bonded to the polymer resin, and an ionic material crosslinking the polymer resin.
Owner:SAMSUNG ELECTRONICS CO LTD

Synergistic photodynamic-photothermal tumor therapy realized by near-infrared ii region aggregation-induced emission nanoparticles

The application discloses a kind of near-infrared two-area aggregation-induced emission nanoparticles to realize synergistic photodynamic-photothermal tumor treatment, belong to using aggregation-induced emission material for cancer treatment field.The preparation method of the photosensitive compound of near-infrared two-area aggregation-induced emission of the present application includes the following steps: compound 1, compound 2, tetra-triphenylphosphine palladium, potassium carbonate are mixed in the mixed solution of tetrahydrofuran and water, backflow reaction, obtain compound 3;Compound 3 and R2 are mixed in acetic anhydride, reaction, obtain the photosensitive compound of the near-infrared two-area aggregation-induced emission.The present application successfully prepares a kind of multifunctional photosensitizer by molecular design, which integrates NIR-II excitation, efficient I-type PDT, super high efficiency PTT and AIE characteristics, provides a kind of new technical scheme for solving the bottleneck of hypoxia in tumor treatment and realizing efficient synergistic treatment.
Owner:THE CHINESE UNIV OF HONG KONG (SHENZHEN)

Diazo naphthoquinone type photosensitive compound, preparation method and application of diazo naphthoquinone type photosensitive compound in photoresist

The invention provides a diazo naphthoquinone type photosensitive compound and a preparation method and application thereof in photoresist, and the preparation method comprises the following steps: mixing diazo naphthoquinone sulfonyl chloride and a phenolic compound in an organic solvent, adding ion exchange resin and an alkaline compound, and reacting to obtain the diazo naphthoquinone type photosensitive compound. According to the method, the ion exchange resin and the alkaline compound are combined, the ion exchange resin not only has an adsorption effect, but also can catalyze the reaction under the cooperation of the alkaline compound, and through the combined action of the ion exchange resin and the alkaline compound, efficient synthesis of the photosensitive compound with extremely low ion (Cl <->) impurities can be achieved; moreover, the ion exchange resin can be recycled and does not generate a large amount of waste, so that the synthesis of the ultra-pure diazo naphthoquinone type photosensitive compound can be realized.
Owner:ANHUI GUOFENG PLASTIC +1

A light-proof controllable reaction device for photosensitive compound synthesis

ActiveCN224474999UEngineeringPhotosensitizing compounds
The utility model relates to compound synthetic technique field, concretely relates to a kind of light-controlled reaction device for photosensitive compound synthesis, including reaction tank, the inside movable joint of reaction tank has receiving plate, the upper end of reaction tank is connected with frame body, and the fixed mounting of emitter is installed on the frame body;It further includes the magnetic ring of reaction tank outer wall, the energized spring is arranged between the magnetic ring and reaction tank middle part, and the magnetic adsorption between the magnetic ring and receiving plate, the lower end fixed mounting of reaction tank has support pipe, the lower end fixed connection of receiving plate has guide rod, the sliding fit between the guide rod and support pipe, reaction groove is set in the reaction tank. Through the magnetic ring of movable joint on the outer wall of reaction tank, and the magnetic adsorption relationship between the magnetic ring and receiving plate, with the continuation of photosensitive reaction, the distance between corresponding receiving plate and emitter increases, corresponding photosensitive intensity reduces, and the synthesis quality of photosensitive compound is guaranteed.
Owner:宁波人健化学制药有限公司

Gram-negative bacteria selective isolation medium and application

ActiveCN116179639BBiotechnologyQuinone
The application belongs to the technical field of microbial culture, and discloses a selective separation culture medium for gram-negative bacteria and application of the culture medium in rapid separation, purification and identification of gram-negative bacteria in samples such as aquatic products, food, water and soil. The selective separation culture medium takes a perylene quinone photosensitive compound as a key active component.
Owner:SOUTH CHINA UNIV OF TECH +2

Donor-acceptor binary light-sensitive compound without heavy atom structure and preparation method and application of donor-acceptor binary light-sensitive compound

The invention discloses a donor-acceptor binary light-sensitive compound without a heavy atom structure and a preparation method of the donor-acceptor binary light-sensitive compound. The preparation method comprises the following steps: by taking a benzothiadiazole derivative as a raw material, introducing triphenylamine through Suzuki cross-coupling reaction; nitro is reduced into amino through iron powder, then the final product, namely the binary photosensitive compound without the heavy atom structure, is generated through a Philips condensation reaction and a reaction with 9-anthracene formaldehyde, and the obtained photosensitive compound is clear in structure and has a donor-acceptor binary orthogonal special electronic structure; the compound has the properties of near-infrared fluorescence emission, high fluorescence quantum yield, high singlet oxygen generation capacity, I-type active oxygen species generation capacity and the like, has a wide application prospect in the field of tumor near-infrared light diagnosis and treatment, and opens up a new path for design of heavy-atom-free small-molecule photosensitive materials.
Owner:NANJING TECH UNIV