23 results about "Photosensitizing compounds" patented technology

The application provides a thick positive photoresist, a photoresist layer and a preparation method thereof, and relates to the technical field of photoetching machines. The thick positive photoresist comprises, in parts by mass, 30-70 parts of phenolic resin, 20-40 parts of a silicon-containing copolymer film-forming resin, 10-20 parts of a photosensitive compound, 0.01-1 part of a leveling agent and 80-150 parts of a solvent. The structure of the silicon-containing copolymer film-forming resin comprises: wherein R is selected from H or C1-C5 alkyl. By adding the silicon-containing copolymer film-forming resin to the phenolic resin, the adhesion, flexibility, thermal stability and mechanical strength of the photoresist layer are improved by using the thermal stability, high-temperature resistance, mechanical properties and corrosion resistance of the film-forming resin, and the photoresist layer is prevented from cracking, pattern deformation and even peeling off.

A photosensitive resin composition having a coloring function is provided. According to one aspect, the provided photosensitive resin composition includes an alkali-soluble resin and a photoactive compound, wherein the alkali-soluble resin and / or the photoactive compound has an absorption maximum of a wavelength of 400 to 550 nm on the basis of UV-vis spectroscopy.

The invention discloses a synergistic photodynamic-photo-thermal tumor treatment method realized by near-infrared two-region aggregation-induced emission nanoparticles, and belongs to the field of cancer treatment by using aggregation-induced emission materials. The preparation method of the near-infrared second-region aggregation-induced emission photosensitive compound comprises the following steps: mixing a compound 1, a compound 2, tetrakis (triphenylphosphine) palladium and potassium carbonate in a mixed solution of tetrahydrofuran and water, and performing reflux reaction to obtain a compound 3; and mixing the compound 3 and the compound R2 in acetic anhydride, and reacting to obtain the near-infrared second-region aggregation-induced emission photosensitive compound. Through molecular design, the multifunctional photosensitizer integrating NIR-II excitation, efficient I-type PDT, ultra-efficient PTT and AIE characteristics is successfully prepared, and a brand new technical scheme is provided for solving the hypoxia bottleneck in tumor treatment and achieving efficient collaborative treatment.

The invention provides a dendrimer-modified phthalocyanine photosensitive compound and application thereof, the dendrimer-modified phthalocyanine photosensitive compound has any one structure as shown in formulas I-IV, and the photosensitive compound has the advantages of simple and controllable synthesis, clear structure, strong light killing ability and the like. The water solubility, tumor targeting and biocompatibility of the zinc phthalocyanine photosensitizer can be improved, the defects of a traditional nano photosensitizer delivery system can be overcome, and the zinc phthalocyanine photosensitizer has a good application prospect in the aspect of photodynamic therapy of tumors.

This invention belongs to the field of photodynamic antibacterial materials technology, specifically relating to a photosensitive compound based on a triphenylamine derivative, its preparation method, and its application. The photosensitive compound based on the triphenylamine derivative of this invention is compound I or compound II; the structural formula of compound I is: [structural formula would be inserted here]; the structural formula of compound II is: [structural formula would be inserted here]. The photosensitive compound based on the triphenylamine derivative of this invention exhibits good antibacterial effects, achieving the killing of Staphylococcus aureus and Listeria monocytogenes at significantly lower concentrations (below 0.5 μM; even below 0.25 μM) under white light irradiation.

The present invention addresses the problem of providing a photosensitive resin composition which is capable of forming a cured product that has a low transmittance around the wavelength of 450 nm after curing even under low oxygen concentration circumstances in which the heating atmosphere at the time of curing has an oxygen concentration of less than 5%, and which is capable of forming a cured product that has a small amount of outgas after curing.　A photosensitive resin composition according to the present invention contains an alkali-soluble resin (A), a photosensitive compound (B), a phenolic compound (C) that has a structure represented by formula (C1), and a phenolic compound (D) that has a structure represented by formula (D1) and has a phenolic hydroxyl group equivalent of 100-500 g / Eq. In formula (C1), n represents an integer of 2 to 4 and * represents an atomic bond. In formula (D1), R1 represents an alkyl group having 1 to 20 carbon atoms, a represents an integer of 1 or 2, b represents an integer of 0 to 2, and * represents an atomic bond.

The photosensitive compound comprises a beta-lactam ring as shown in a formula I and a Ce6 photosensitizer, and does not contain a quenching group. When the compound is in contact with MRSA and other gram positive bacteria, the beta-lactam ring structure in the compound is combined with MRSA and other gram positive bacteria cell wall synthesis key enzyme-transpeptidase to provide targeting for the photosensitizer Ce6, so that the targeting effect on the bacteria is realized, the specificity is strong, a large amount of active oxygen is generated under illumination to kill the bacteria, and the compound can be used as a photosensitizer Ce6. Meanwhile, damage to normal tissues is avoided, photodynamic therapy on bacterial infection is facilitated, and the photodynamic therapy has high efficiency and low tissue toxicity.

This invention relates to a polyimide material and its preparation method, belonging to the field of polymer materials technology. The invention uses a macromolecular diamine monomer containing PEG segments and 4,4'-diaminodiphenyl ether as a compounded diamine monomer, reacting it with a dianhydride monomer compounded with 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride and 3,3',4,4'-biphenyl tetracarboxylic dianhydride to prepare a polyimide with carboxyl groups in its side chains. Then, the polyimide with carboxyl groups in its side chains is grafted with a photosensitive compound to prepare a photosensitive polyimide material. The PEG-based macromolecular diamine provides excellent solubility, film-forming properties, and low-temperature flexibility; the rigid aromatic diamine improves mechanical strength, thermal stability, and pattern fidelity; the ether-bonded ODPA ensures solubility and uniform crosslinking; and the biphenyl-type BPDA increases modulus, reduces water absorption, and improves resolution.

A method for forming a semiconductor device includes forming a photoresist layer over a substrate, exposing the photoresist layer to radiation to form a pattern therein, and selectively removing portions of the photoresist layer that are not exposed to the radiation to form a patterned photoresist layer. The photoresist layer comprises a fluorine-containing polymer, a crosslinker and a photoactive compound.

The present application relates to a photo-crosslinkable perfluorinated ion membrane and a method for preparing the same, wherein the photo-crosslinkable perfluorinated ion membrane is obtained by mixing a perfluorinated ion exchange resin containing sulfonic acid groups or phosphoric acid groups as a film-forming resin with a quaternized photosensitive compound.

A semiconductor package comprises a base chip, a plurality of semiconductor chips sequentially stacked on the base chip, bump structures between the base chip and a lowermost semiconductor chip of the plurality of semiconductor chips, and between the plurality of semiconductor chips, adhesive layers surrounding the bump structures between the base chip and the lowermost semiconductor chip of the plurality of semiconductor chips and between the plurality of semiconductor chips. The adhesive layers have a width equal to or less than a width of each of the plurality of semiconductor chips in a direction parallel to an upper surface of the base chip. At least one of the adhesive layers comprises a polymer resin having a hydrophilic group, a photosensitive compound physically bonded to the polymer resin, and an ionic material crosslinking the polymer resin.

The application discloses a kind of near-infrared two-area aggregation-induced emission nanoparticles to realize synergistic photodynamic-photothermal tumor treatment, belong to using aggregation-induced emission material for cancer treatment field.The preparation method of the photosensitive compound of near-infrared two-area aggregation-induced emission of the present application includes the following steps: compound 1, compound 2, tetra-triphenylphosphine palladium, potassium carbonate are mixed in the mixed solution of tetrahydrofuran and water, backflow reaction, obtain compound 3;Compound 3 and R2 are mixed in acetic anhydride, reaction, obtain the photosensitive compound of the near-infrared two-area aggregation-induced emission.The present application successfully prepares a kind of multifunctional photosensitizer by molecular design, which integrates NIR-II excitation, efficient I-type PDT, super high efficiency PTT and AIE characteristics, provides a kind of new technical scheme for solving the bottleneck of hypoxia in tumor treatment and realizing efficient synergistic treatment.

The invention provides a diazo naphthoquinone type photosensitive compound and a preparation method and application thereof in photoresist, and the preparation method comprises the following steps: mixing diazo naphthoquinone sulfonyl chloride and a phenolic compound in an organic solvent, adding ion exchange resin and an alkaline compound, and reacting to obtain the diazo naphthoquinone type photosensitive compound. According to the method, the ion exchange resin and the alkaline compound are combined, the ion exchange resin not only has an adsorption effect, but also can catalyze the reaction under the cooperation of the alkaline compound, and through the combined action of the ion exchange resin and the alkaline compound, efficient synthesis of the photosensitive compound with extremely low ion (Cl <->) impurities can be achieved; moreover, the ion exchange resin can be recycled and does not generate a large amount of waste, so that the synthesis of the ultra-pure diazo naphthoquinone type photosensitive compound can be realized.

The utility model relates to compound synthetic technique field, concretely relates to a kind of light-controlled reaction device for photosensitive compound synthesis, including reaction tank, the inside movable joint of reaction tank has receiving plate, the upper end of reaction tank is connected with frame body, and the fixed mounting of emitter is installed on the frame body;It further includes the magnetic ring of reaction tank outer wall, the energized spring is arranged between the magnetic ring and reaction tank middle part, and the magnetic adsorption between the magnetic ring and receiving plate, the lower end fixed mounting of reaction tank has support pipe, the lower end fixed connection of receiving plate has guide rod, the sliding fit between the guide rod and support pipe, reaction groove is set in the reaction tank. Through the magnetic ring of movable joint on the outer wall of reaction tank, and the magnetic adsorption relationship between the magnetic ring and receiving plate, with the continuation of photosensitive reaction, the distance between corresponding receiving plate and emitter increases, corresponding photosensitive intensity reduces, and the synthesis quality of photosensitive compound is guaranteed.

The application belongs to the technical field of microbial culture, and discloses a selective separation culture medium for gram-negative bacteria and application of the culture medium in rapid separation, purification and identification of gram-negative bacteria in samples such as aquatic products, food, water and soil. The selective separation culture medium takes a perylene quinone photosensitive compound as a key active component.

A method of forming a pattern in a photoresist layer includes forming a photoresist layer over a substrate and selectively exposing the photoresist layer to actinic radiation to form a latent pattern. The latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern. The photoresist layer includes a photoresist composition including a photoactive compound and a polymer. The polymer has one or more of iodine or an iodo group attached to the polymer, and the polymer includes one or more monomer units having a crosslinker group, and the monomer units having a crosslinker group are one or more of:or the photoresist composition includes a photoactive compound, a polymer including an iodine or an iodo-group, and a crosslinker with two to six crosslinking groups.

The invention discloses a donor-acceptor binary light-sensitive compound without a heavy atom structure and a preparation method of the donor-acceptor binary light-sensitive compound. The preparation method comprises the following steps: by taking a benzothiadiazole derivative as a raw material, introducing triphenylamine through Suzuki cross-coupling reaction; nitro is reduced into amino through iron powder, then the final product, namely the binary photosensitive compound without the heavy atom structure, is generated through a Philips condensation reaction and a reaction with 9-anthracene formaldehyde, and the obtained photosensitive compound is clear in structure and has a donor-acceptor binary orthogonal special electronic structure; the compound has the properties of near-infrared fluorescence emission, high fluorescence quantum yield, high singlet oxygen generation capacity, I-type active oxygen species generation capacity and the like, has a wide application prospect in the field of tumor near-infrared light diagnosis and treatment, and opens up a new path for design of heavy-atom-free small-molecule photosensitive materials.

This invention provides a method for homogeneous immunoassay of target antibody analytes, along with its reagents and instrument system. This method eliminates the conventionally used luminescent bulbs and employs reactive oxygen species (ROS) that react with oxygen-sensitive substances to generate electrical signals detectable by electrodes. These ROS are generated by the excitation of photosensitive compounds, eliminating the need for complex instrument modules. This method is more conducive to the reaction between the antibody analyte and the antigen, shortens the reaction time, and improves antibody utilization, resulting in higher sensitivity and accuracy in the detection instrument of this invention.

The invention provides a high-resolution positive photoresist composition, a preparation method thereof and a photoetching structure, and relates to the technical field of photoetching. The high-resolution positive photoresist composition comprises phenolic resin, photosensitizer copolymer film-forming resin, a diazo naphthoquinone photosensitive compound and a solvent, the photosensitizer copolymer film-forming resin is at least one of a first photosensitive compound, a second photosensitive compound and a third photosensitive compound; according to the composition, the photosensitive group is copolymerized into the film-forming resin, so that the distribution uniformity of the photosensitizer in a system can be improved, local enrichment is reduced, and the pattern boundary definition and the line width control precision are remarkably improved. The copolymerization structure enhances the consistency of photoreaction, reduces the exposure dose demand, inhibits the T-topping phenomenon, and improves the side wall perpendicularity and the development quality. The structural difference of the first to third photosensitive compounds enables the material performance to be adjustable, gives consideration to the resolution, the developing speed and the thermal stability, and is beneficial to meet different micromachining requirements.

A photoactive compound of formula (1a) or (1b):wherein R1 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl comprising an aromatic ring heteroatom chosen from nitrogen, oxygen, or a combination thereof; R2 and R3 are as provided herein; R4 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; and M+ is an organic cation.

The application relates to the technical field of medical materials, and discloses photosensitive material with a blood vessel repair function, a preparation method of the photosensitive material and a balloon dilatation catheter. The photosensitive material with the blood vessel repair function is obtained by splicing water-soluble DNA and photosensitive compounds through a chemical bond, does not affect the photosensitivity of the material, can quickly dissolve, permeate and diffuse into a blood vessel wall after reaching a lesion site, and has the advantages that increasing the water solubility is beneficial to metabolism of subsequent small molecules, reduces accumulation toxicity caused by large-dose application of small molecule drugs due to low solubility, the material is activated by specific wavelength light, covalent crosslinking between amino acids in the blood vessel wall is generated, the blood vessel is stably supported, in-stent restenosis does not occur, the treatment purpose can be well achieved after 1-minute balloon rapid expansion, the operation risk is greatly reduced, and the survival rate of patients is improved.

A compound represented by Chemical Formula 1:Ar1-L1-Ar2-L2-X—R1,  [Chemical Formula 1]in which Ar1 and Ar2 are aromatic rings or heterocyclic aromatic rings that each include at least one iodine atom and Ar1 also includes at least one hydroxyl group, L1 and L2 are each a divalent linking group, X is —C(═O)O— or —S(═O)2—O—, and R1 is an acid-labile protecting group. Photoresist compositions that include the compound, and methods of manufacturing an integrated circuit device by using the photoresist composition.