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Ferro-nickel thin-membrane and its preparation

A film and nickel-iron technology, applied in the field of nickel-iron film and its preparation, can solve the problems of difficult ratio control, poor stability of the preparation process and the like, and achieve the effects of easy temperature control, simple method and simple preparation method

Inactive Publication Date: 2007-05-16
UNIV OF SCI & TECH BEIJING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It solves the problem that it is difficult to control the proportion of the face-centered cubic structure part and the body-centered cubic structure part and the stability of the preparation process is poor when preparing the nickel-iron thin film composed of the face-centered cubic structure and the body-centered cubic structure

Method used

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  • Ferro-nickel thin-membrane and its preparation
  • Ferro-nickel thin-membrane and its preparation
  • Ferro-nickel thin-membrane and its preparation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] The Si substrate with thermally oxidized silicon dioxide with a diameter of 50 mm was ultrasonically cleaned in the order of acetone, deionized water and ethanol, and the cleaned substrate was dried with hot air at 60°C. Put the substrate into the coating chamber of the magnetron sputtering coating machine, pump the coating chamber to 1×10 -4 Vacuum in Pascal (Pa). Then, with a double-slope target (Ni 80 Fe 20 target and Fe target) DC plasma magnetron sputtering coater to deposit about 200 nm thick Ni 33 Fe 67 film. The deposition conditions are: argon pressure 1.2 Pascal (Pa), Ni 80 Fe 20 The sputtering power of the target was 84 watts (W), the sputtering power of the Fe target was 173 watts (W), the substrate temperature was 40°C, and the distance from the substrate to each target was 100 mm. Film thickness can be controlled by adjusting the deposition time.

Embodiment 2

[0020] A 50 mm diameter Si substrate with thermally oxidized silicon dioxide was ultrasonically cleaned in the order of acetone, deionized water and ethanol, and the cleaned substrate was dried with hot air at 60°C. Put the substrate into the coating chamber of the magnetron sputtering coating machine, pump the coating chamber to 1×10 -4 Vacuum in Pascal (Pa). Then, with a double-slope target (Ni 80 Fe 20 target and Fe target) DC plasma magnetron sputtering coater to deposit about 200 nm thick Ni 21 Fe 79 film. The deposition conditions are: argon pressure 1.2 Pascal (Pa), Ni 80 Fe 20 The sputtering power of the target was 42 watts (W), the sputtering power of the Fe target was 173 watts (W), the substrate temperature was 40°C, and the distance from the substrate to each target was 100 mm. Film thickness can be controlled by adjusting the deposition time.

[0021] Ni in vacuum 21 Fe 79 film and Ni 33 Fe 67 Film heat treatment, heat treatment conditions: vacuum 4 × ...

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Abstract

A Ni-Fe film with face-centered cubic structure (0-100%) is prepared by physical vapor deposition. It features that the cylindrical crystal grains are perpendicular to the surface of substrate and the percentage of face-centered cubic structure can be regulate by heat treatment at the temp lower than 500 deg.C for obtaining various physical properties.

Description

technical field [0001] The invention belongs to the technical field of nickel-iron thin film materials, and particularly provides a nickel-iron thin film (Ni-iron thin film) x Fe 1-x film) and its preparation method. Background technique [0002] Because nickel-iron thin films have good magnetic, electrical and magnetoresistance properties, and are easy to prepare, nickel-iron thin films are widely used as low-dimensional functional materials in memory, microsensors, microtransformers and microdrivers. As people already know, the crystalline structure of nickel-iron alloy will change with the different components of nickel and iron, that is, from face-centered cubic structure (fcc structure) to body-centered cubic structure (bcc structure) or from bulk The centered cubic structure (bcc structure) transforms into the face centered cubic structure (fcc structure), resulting in a change in the physical properties of the nickel-iron alloy. For the nickel-iron alloy film mater...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B15/04
Inventor 邱宏陈晓白潘礼庆吴平王凤平
Owner UNIV OF SCI & TECH BEIJING
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