Semiconductor memory device
A storage device and semiconductor technology, applied in static memory, digital memory information, information storage, etc., can solve problems such as increased cost, increased circuit area, and increased circuit area.
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[0038] FIG. 1 is a circuit diagram showing the structure of a memory cell in a semiconductor memory device according to a first embodiment of the present invention. In FIG. 1, 100 is a memory cell, WL is a word line, BL is a bit line, 101 is an access transistor, 102 is a capacitor (capacitive element), and VCP is a cell anode power supply. Such a structure is the same as the existing example. The access transistor 101 is composed of a P-channel transistor. As the gate oxide film of the access transistor 101, a thin (1.9 nm to 3.0 nm) oxide film is used. In addition, the capacitor 102 may be a structure in which an insulating film is sandwiched between semiconductors, or a gate capacitor of a MOS transistor may be used. At this time, in order to suppress leakage current through the gate, a slightly thick film (2.4 nm to 5.0 nm) is used as the gate oxide film of the MOS transistor. When leakage current does not pose a problem, the same film thickness as the gate oxide film o...
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