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Diluent for washing photo-sensitive resin

A technology of photosensitive resin layer and photosensitive resin, which is applied in photosensitive material processing, electrical components, semiconductor/solid-state device manufacturing, etc., and can solve problems such as solubility, volatile and toxic interface linearity, cleaning effect, etc.

Inactive Publication Date: 2003-06-11
DUKSUNG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, conventional mixed solvents have problems in terms of solubility, volatility, toxicity, interface linearity, cleaning effect, etc., so the development of new diluents is strongly demanded.

Method used

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  • Diluent for washing photo-sensitive resin
  • Diluent for washing photo-sensitive resin
  • Diluent for washing photo-sensitive resin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Example 1: Manufacture of diluent for cleaning photosensitive resin

[0034] Thinners 1 to 16 and Comparative Examples 1 and 2 manufactured by changing the composition ratio of the diluents are shown in the following [Table 1]

[0035] category

Embodiment 2

[0036] Embodiment 2 solvent speed test

[0037] In order to carry out the test of the dissolution rate of the diluent of the present invention in the photosensitive resin, the "thinner 1 to thinner 9" of the above [Table 1] were compared with SLP-H20 (manufactured by DONGWOO FINE-CHEM (Co., Ltd.)), "thinner 10 to thinner 15" were tested for CPD-0727LG (manufactured by DONGJIN SEMlCHEM (Co., Ltd.)), and "Comparative Examples 1 and 2" were tested for SLP-H20 (manufactured by DONGWOO FINE-CHEM (Co., Ltd.).

[0038] For the test, firstly, the above-mentioned photosensitive resin products were coated on a silicon oxide wafer, which was weakly fired at 80° C. for 3 minutes, and then cut into test pieces of 1 cm×1 cm. Each test piece was deposited in each diluent solution of [Table 1] and the solution of the comparative example at room temperature, and the complete removal time of the photosensitive resin was measured. The resulting dissolution rates are shown in [Table 2] below.

Embodiment 3

[0039] The evaluation of embodiment 3 linearity

[0040] Similar to the above-mentioned "Example 2", the linearity of the interface of the test piece from which the photosensitive resin layer was removed was examined with an optical microscope, and the results were classified into three grades and evaluated. The evaluation results are shown in [Table 2] below.

[0041] category

dissolution rate

Linearity

category

dissolution rate

Linearity

Thinner 1

B

A

Thinner 10

A

A

Thinner 2

A

A

Thinner 11

B

A

Thinner 3

A

A

Thinner 12

A

A

Thinner 4

A

B

Thinner 13

A

A

Thinner 5

A

B

Thinner 14

B

A

Thinner 6

B

B

Thinner 15

A

A

Thinner 7

B

A

Thinner 16

B

A

Thinner ...

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PUM

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Abstract

The present invention provides an excellent soluble, low poisonove, volatile thinner composition for rinsing photoresist, which is a thinner composition for removing photoresist resin before exposing the pattern of photoresist resin layer, it is selectively chosen from dimethyl glutarate, dimethyl succinate, dimethyl adipate or the dibasic ester (DBE) by the group of these compounds.

Description

technical field [0001] The present invention relates to the thinner used for removing the photosensitive resin before the pattern exposure treatment of the photosensitive resin layer in the manufacturing process of electronic components and electronic components such as liquid crystal display screens and plasma display screens. Diluents with superior effects of toxicity, moderate volatility, etc., consisting of dimethylglutarate, dimethylsuccinate, dimethyladipate, or combinations thereof Group selected dibasic ester (dibasic ester, DBE) composition. Background technique [0002] Generally speaking, a semiconductor integrated circuit or a flat panel display (FPD) circuit is composed of extremely fine structures and manufactured through a multi-stage process. Among them, photo-lithography patterning technology is a well-known method in the manufacture of various electronic components and electronic components such as liquid crystal displays and plasma displays. In this meth...

Claims

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Application Information

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IPC IPC(8): G03F7/26
Inventor 金址洪崔好星金泰根吕相赫朴海成
Owner DUKSUNG
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