Nitrogen-containing titanium dioxide photocatalytic film and preparing method thereof
A photocatalytic thin film, titanium dioxide technology, applied in the direction of catalyst activation/preparation, chemical instruments and methods, physical/chemical process catalysts, etc., to achieve the effect of improving degradation ability
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Embodiment 1
[0018] 1) Take glass sheet as the carrier, after cleaning, put it into the vacuum coating equipment with pure metal titanium target, the background vacuum is 3.0×10 -3 Pa;
[0019] 2) Using intermediate frequency reactive magnetron sputtering:
[0020] Medium frequency AC arc suppression power supply with a frequency of 15kHz and a current density of 3mA / cm 2 ,
[0021] The working gas is 99.999% high-purity argon, and its pressure is controlled by an automatic pressure controller to 1.0Pa;
[0022] The reaction gas is a mixed gas of high-purity oxygen and nitrogen, and the partial pressure is controlled by a mass flow controller to be 0.8Pa, wherein nitrogen accounts for 40% of the total flow of the reaction gas;
[0023] The carrier temperature (substrate temperature) during film deposition is 150°C;
[0024] The magnetron sputtering time is 60 minutes.
[0025] Under the above conditions, the obtained nitrogen-containing titanium dioxide photocatalytic film is composed...
Embodiment 2~4
[0026] Example
[0027] Table 1
Embodiment 2
[0028] After the end of Example 2, the obtained nitrogen-containing titanium dioxide photocatalytic film is composed of a mixture of amorphous and anatase phases, nitrogen exists only in an interstitial state, and the content of nitrogen is 0.7%. The absorption limit of the film was measured at 461 nm by ultraviolet and visible light spectrophotometer. The photocatalytic experiment proves that the photocatalytic degradation ability of this film is three times that of the titanium dioxide film.
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