Substrate with ito coating film and manufacture thereof
A manufacturing method and substrate technology, applied in cable/conductor manufacturing, conductive layer on insulating carrier, ion implantation plating, etc., can solve problems such as insufficient satisfaction, poor film adhesion, and inability to use
Inactive Publication Date: 2003-12-31
NIPPON SHEET GLASS CO LTD
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Problems solved by technology
[0005] Alternatively, using the SiO 2 The substrate of the intermediate layer formed by the film has the problem that chemical resistance, especially alkali resistance is low
[0006] However, it is true that the method disclosed in Japanese Patent Application Laid-Open No. 6-148618 can improve the alkali resistance of the substrate, but only for Si as the target, O 2 Formation of SiO by reactive sputtering method as introduced gas x film as an effective method for the intermediate layer, for the formation of SiO by the high-frequency sputtering method previously used as an intermediate layer 2 Membranes are not effective
Thus, in this conventional method, the high-frequency sputtering method that can form a film with higher adhesion than the usual reactive sputtering method cannot be used.
Therefore, compared to the SiO used previously as an interlayer 2 The film has a problem of poor adhesion
[0007] Furthermore, it cannot be said that the alkali resistance of the substrate obtained by this conventional film-forming method fully satisfies the above-mentioned required characteristics.
Method used
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Embodiment
[0081] Next, an embodiment of the present invention will be described in detail.
[0082] As the substrate used in the sample, a color filter 102 composed of three image elements of red, green and blue (RGB) is formed on a glass substrate 101, and an alkali organic protective film 103 is coated thereon. .
[0083] The substrate is cleaned with an alkaline detergent in an immersion-type ultrasonic cleaning machine, and dried with warm air. Then, put it into the in-line vacuum film forming device, heat and exhaust until it reaches 1.3×10 -8 After Pa and about 220°C, use an inert gas (Ar) as the introduced gas sputtering target, and use a reactive gas (N 2 Or O 2 ) As a compound for introducing a gas sputtering target and a reactive gas, one or two intermediate layers are formed on each substrate.
[0084] Next, the substrate on which the intermediate layer is formed is not exposed to the atmosphere, and the ITO film 105 with a thickness of 150 nm is continuously formed on the substr...
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The present invention provides a substrate with an ITO coating film, which is excellent in the resistance to an alkali and in adhesion characteristics. The substrate with an ITO coating film comprises a glass substrate (101) and, laminated thereon in the following order, a color filter (102), an organic protective film (103), intermediate layers (104a, 104b), and an ITO coating film (105) with an electrode pattern, wherein the intermediate layer (104a) is formed on the surface of the organic protective film (103) by the high frequency spattering method using Ar as an introducing gas and comprises a metal oxide less prone to dissolution in an alkaline solution, and the intermediate layer (104b) is formed by a reactive sputtering method or a high frequency spattering method and comprises a metal oxide or metal nitride being less prone to dissolution in an alkaline solution.
Description
Technical field [0001] The present invention relates to a substrate with a tin oxide-containing indium oxide (hereinafter referred to as ITO) film and a manufacturing method thereof, and particularly to a substrate with an ITO film used as a liquid crystal display element of a color liquid crystal display and a manufacturing method thereof. Background technique [0002] In the past, as a liquid crystal display element used in a color liquid crystal display panel or the like, a substrate with a tin oxide-containing indium oxide (hereinafter referred to as ITO) film has been used. [0003] A general substrate with an ITO film has a structure in which a color filter, an organic protective film, and an ITO film are sequentially laminated on the surface of a glass substrate in the following order. [0004] The ITO film laminated on the surface of the substrate has a function as an electrode, and its electrode pattern is usually formed by photolithography. Using photolithography, a str...
Claims
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IPC IPC(8): G02F1/1333H10N10/856C23C14/06C23C14/08G02F1/1335G02F1/1343G09F9/00G09F9/30G09F9/35H01B5/14H01B13/00
CPCG02F2001/133519G02F1/133514G02F1/13439G02F1/133519G02F1/1333
Inventor 清田正悟加藤之启
Owner NIPPON SHEET GLASS CO LTD