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Etching liquid for silver alloy

An etchant and silver alloy technology, which is applied in the field of etchant, can solve the problems of not widely using the yellow light process of wafers or panels, silver alloys without etchant, and high resistance of chromium metal

Inactive Publication Date: 2004-01-07
RITDISPLAY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The current semiconductor or flat panel display devices mostly use chromium metal as the wire material, but because of the high resistance of chromium metal, researchers have been seeking to use metals with lower resistance as the material of chip wires
In the past, it was proposed to use silver as the material of the wire, but because there is no suitable and stable etching solution composition, it has not been widely used.
[0003] The silver alloy containing more than 60% silver, although its resistance value is not as low as silver metal, its resistance value is far lower than that of chromium metal, and it is still a suitable chip wire material. However, because silver alloy does not have a suitable etching solution , so it is not widely used in the yellow light process of wafers or panels

Method used

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Examples

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Embodiment Construction

[0012] Example

[0013] Example

[0014] Example

[0015] From the above data, it can be seen that the etching solution of the present invention can effectively etch silver alloys, and the degree and rate of etching silver alloys can be controlled by time control and concentration selection. It can be used in conjunction with yellow light processes. Fabrication of MEMS, wafer or panel substrates.

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Abstract

The present invention relates to an etching liquor for silver alloy, it includes 1-60 weight portions of ammonium compound, 1-60 weight portions of hydrogen peroxide and 0-96 weight portions of water, According to the requirements said etching liquor also can include 1-10 weight portions of sulfuric acid or organic acid so as to can obtain optimum control of etching rate.

Description

technical field [0001] The invention relates to an etching solution, especially an etching solution suitable for silver alloys. Background technique [0002] Current semiconductor or flat panel display devices mostly use chromium metal as the wire material, but because of the high resistance of chromium metal, researchers have been seeking to use metals with lower resistance value as the material of chip wires. In the past, it was proposed to use silver as a wire material, but it has not been widely used because there is no suitable and stable etchant composition. [0003] The silver alloy containing more than 60% silver, although its resistance value is not as low as silver metal, its resistance value is far lower than that of chromium metal, and it is still a suitable chip wire material. However, because silver alloy does not have a suitable etching solution , so it is not widely used in the yellow light process of wafers or panels. [0004] In the spirit of active inven...

Claims

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Application Information

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IPC IPC(8): C23F1/40
Inventor 李旭峰姚信字邹忠哲施明忠叶添昇吴朝钦
Owner RITDISPLAY
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