Lithographic printing projector containing secondary electronic clear cell
A technology of lithographic printing and projection devices, which is applied in the direction of photoplate-making process exposure devices, electrical components, patterned surface photoplate-making processes, etc., to achieve the effect of reducing the chance of pollution
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[0046] figure 1 It is a schematic representation of a lithographic projection device according to a specific embodiment of the present invention. The unit includes:
[0047] a radiation system IL for providing a radiation projection beam PB (e.g. EUV radiation) having 11-14 nm, in this particular example, the radiation system also includes a radiation source LA;
[0048] A first target table (mask table) MT, provided with a mask holder for fixing a mask MA (e.g. a reticle), and with first positioning means PM for precise positioning of the mask relative to the target PL connect;
[0049] A second target stage (substrate table) WT, provided with a substrate holder for holding a substrate W (e.g. a resist-coated silicon wafer), is connected to a second positioning device for precise positioning of the substrate relative to the target PL ;
[0050] A projection system ("lens") PL is used to image the radiation portion of the mask MA onto a target portion C of a substrate W (...
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