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Method for making double-layer alloy plating metallic film resistor

A metal film resistor, alloy coating technology, applied in the manufacture of resistors, non-adjustable metal resistors, resistors, etc., can solve the problems of poor adhesion between the coating and the insulator, the yield of the coating brittle crack, and the decline, so as to overcome the brittleness of the coating. cracked effect

Inactive Publication Date: 2004-11-17
JIANGSU AISEN SEMICON MATERIAL CO LTD
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Problems solved by technology

For this reason, the current useful sputtering method is to plate a nickel-chromium (Ni-Cr) alloy coating on the insulating material, and control the resistance value by controlling its thickness, and process it by laser cutting to achieve accurate resistance value, but Because the coating is hard and brittle, the coating will be brittle during laser cutting and the yield will decrease.
The other is to directly plate copper-nickel (Cu-Ni) alloy coating on the insulating material. Although the resistance value is stable, the bonding force between the coating and the insulator is not as good as the former

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  • Method for making double-layer alloy plating metallic film resistor

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Embodiment Construction

[0012] As shown in Figure 1, a layer of Ni-Cr alloy 2 is first sputtered on at least one layer of insulating substrate 1, and its composition ratio is Ni:Cr (w / w)=75:25~85~15, and then One deck of Cu-Ni alloy coating 3 is plated on this coating, and its composition ratio is Cu: Ni (w / w)=60: 40~40: 60; , after sputtering a layer of Ni-Cr alloy on at least one layer of insulating film material, then go through the following steps:

[0013] 1. Activated by acid solution at room temperature;

[0014] 2. Wash with water;

[0015] 3. Suspension plating or barrel plating of Cu-Ni alloy layer can be carried out for 0.5-6 hours or longer according to the requirements of the resistance value;

[0016] 4. Wash with water;

[0017] 5. Dry.

[0018] The composition of the acid used for activation described in step 1 can be hydrochloric acid or sulfuric acid, concentration of hydrochloric acid solution,

[0019] The concentration of sulfuric acid is 5%-20%, and the activation time is 0...

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Abstract

The invention refers to a manufacturing method for a kind of dual-layer alloy coating layer metal film resistance. The character lies in: a layer of Ni-Cr alloy is splattered onto the at least a layer of insulating base, the proportion is: Ni: Cr (w / w) =75:25-85:15, then a layer of Cu-Ni alloy coating film is coated on the coating layer, the proportion is: Cu: Ni (w / w) =60:40-40:60; the steps are: with the normal spattering method, a layer of Ni-Cr alloy is splattered on the base, then with following steps: the normal temperature activating of acid liquid; rinsing with water; suspending coating or rolling coating the Cu-Ni layer; rinsing with water; drying. The invention solves the bonding force problem between the metal film and the insulating base, overcomes the deficiency that the coating layer is fracture when using laser to process, the temperature coefficient of the resistance film can maintain at í‚2%-í‚0.5%.

Description

technical field [0001] The invention relates to a method for manufacturing a double-layer alloy coating metal film resistor, in particular to a method for manufacturing a composite alloy metal film resistor in which copper-nickel alloy is electroplated on a nickel-chromium alloy coating layer. Background technique [0002] Metal film resistors are widely used in electrical and electronic circuits. Its precise resistance and stable temperature coefficient make many electrical or electronic circuits work stably at different temperatures. Therefore, the temperature coefficient of resistance is required to be within ±1%. the following. For this reason, the current useful sputtering method is to plate a nickel-chromium (Ni-Cr) alloy coating on the insulating material, and control the resistance value by controlling its thickness, and process it by laser cutting to achieve accurate resistance value, but Since this coating is hard and brittle, the coating will be brittle during la...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01C7/00H01C17/00
Inventor 郑振顾卫忠郭国才
Owner JIANGSU AISEN SEMICON MATERIAL CO LTD
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