Interlayer connection structure and its building method
A technology of interlayer connection and conductive connection, which is applied in the direction of electrical connection formation of printed components, multi-layer circuit manufacturing, electrical components, etc. It can solve the problems of difficult uniform contact, inability to conduct conductive connection, and reinforcing fiber hindering contact, etc., to achieve uniform thickness Effect
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[0025] (The first method of forming an interlayer connection structure invented)
[0026] In this embodiment, it is described that the wiring layer 22 formed on both sides of the central substrate and the metal layer 27 formed on the upper layer via the insulating layer 26 are connected between layers through the interlayer connection protrusion B to form an interlayer connection structure. example of.
[0027] First, if figure 1 As shown in (1), a laminated body L is prepared in which the pattern of the wiring layer 22 is formed on both surfaces of the base material 21 and the interlayer connection protrusions B are formed on the wiring layer 22 . At this time, any method can be used for patterning the wiring layer 22, for example, a method using an etching resist, a method using a resist for pattern plating, or the like can be used. As the metal constituting the wiring layer 22, copper, nickel, tin, etc. are generally used, and copper is preferably used. As the base mate...
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