System and method for testing three-dimensional motion of microstructure by image matching and phase shift interference
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- TIANJIN UNIV
- Publication Date
- 2005-08-17
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method and system for testing three-dimensional motion parameters of microstructures in microelectromechanical systems (MEMS) using image matching and phase shifting interference techniques comprehensively. It belongs to the mechanical quantity measurement technology of the photoelectric non-contact method for micro-electromechanical systems. Background technique
[0002] Micro-Electro-Mechanical Systems (MEMS) is developed on the basis of microelectronics technology. It is an integrated device or system composed of electronic and mechanical components. It is manufactured by a mass-processing process compatible with integrated circuits. At the same time, computing, sensing and execution are integrated, thus changing the way of perceiving and controlling the natural world. Most of the manufacturing processes of microelectromechanical systems (MEMS) are compatible with the processing technol...